Structure and properties of metal nitride films produced by ion implantation

Nitride films are grown on Ti, Ta, Mo, W, Ni, Si(111), and NaCl(100) substrates by ion implantation, and their phase composition, structure, and properties are studied. The films produced using a titanium target are multiphase and contain, in addition to TiN and Ti sub(2)N (and minor amounts of nitr...

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Bibliographic Details
Published in:Inorganic materials 2005-01, Vol.41 (1), p.36-41
Main Authors: Ignatenko, P. I., Klyakhina, N. A., Badekin, M. Yu
Format: Article
Language:English
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Summary:Nitride films are grown on Ti, Ta, Mo, W, Ni, Si(111), and NaCl(100) substrates by ion implantation, and their phase composition, structure, and properties are studied. The films produced using a titanium target are multiphase and contain, in addition to TiN and Ti sub(2)N (and minor amounts of nitrides of the substrate metal), TiO sub(2) and oxides of the substrate metal in the form of islands 0.04 to 0.2 mu m in size, distributed at random over the film. The presence of several phases in the films determines their mechanical and electrical properties and ensures good adhesion and corrosion resistance.
ISSN:0020-1685
1608-3172
DOI:10.1007/s10789-005-0073-5