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Efficient removal of phenol from water using Fe2O3 semiconductor catalyst under UV laser irradiation
Efficient removal of phenol was carried out using laser induced photocatalyis process in the presence of Fe 2 O 3 semiconductor catalysts, and under UV laser irradiation. Parametric dependence of the removal process was investigated carefully by variation of laser irradiation time, laser energy, and...
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Published in: | Journal of environmental science and health. Part A, Toxic/hazardous substances & environmental engineering Toxic/hazardous substances & environmental engineering, 2009-04, Vol.44 (5), p.515-521 |
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container_end_page | 521 |
container_issue | 5 |
container_start_page | 515 |
container_title | Journal of environmental science and health. Part A, Toxic/hazardous substances & environmental engineering |
container_volume | 44 |
creator | Gondal, Mohammed A. Sayeed, Mohammad N. Yamani, Zain H. Al-Arfaj, Abdul Rahman |
description | Efficient removal of phenol was carried out using laser induced photocatalyis process in the presence of Fe
2
O
3
semiconductor catalysts, and under UV laser irradiation. Parametric dependence of the removal process was investigated carefully by variation of laser irradiation time, laser energy, and concentration of the catalysts. pH measurements were also carried out to understand the photocatalytic process for removal of phenol. Maximum phenol removal achieved in this process was more than 90% during 1 hour of laser irradiation. This is considered highly efficient as compared to conventional setups using lamps. Reaction kinetics for the removal of phenol was also studied, and a reaction rate of 0.017 min
− 1
was estimated, following first order kinetics. |
doi_str_mv | 10.1080/10934520902720033 |
format | article |
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2
O
3
semiconductor catalysts, and under UV laser irradiation. Parametric dependence of the removal process was investigated carefully by variation of laser irradiation time, laser energy, and concentration of the catalysts. pH measurements were also carried out to understand the photocatalytic process for removal of phenol. Maximum phenol removal achieved in this process was more than 90% during 1 hour of laser irradiation. This is considered highly efficient as compared to conventional setups using lamps. Reaction kinetics for the removal of phenol was also studied, and a reaction rate of 0.017 min
− 1
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2
O
3
semiconductor catalysts, and under UV laser irradiation. Parametric dependence of the removal process was investigated carefully by variation of laser irradiation time, laser energy, and concentration of the catalysts. pH measurements were also carried out to understand the photocatalytic process for removal of phenol. Maximum phenol removal achieved in this process was more than 90% during 1 hour of laser irradiation. This is considered highly efficient as compared to conventional setups using lamps. Reaction kinetics for the removal of phenol was also studied, and a reaction rate of 0.017 min
− 1
was estimated, following first order kinetics.</description><subject>Applied sciences</subject><subject>Catalysts</subject><subject>clean water supplies</subject><subject>Exact sciences and technology</subject><subject>General purification processes</subject><subject>Irradiation</subject><subject>Lamps</subject><subject>laser applications</subject><subject>Lasers</subject><subject>organic pollutants</subject><subject>oxidation</subject><subject>Phenol</subject><subject>phenol removal</subject><subject>Photocatalysis</subject><subject>Pollution</subject><subject>Reaction kinetics</subject><subject>Semiconductors</subject><subject>TiO</subject><subject>wastewater treatment</subject><subject>Wastewaters</subject><subject>Water treatment and pollution</subject><issn>1093-4529</issn><issn>1532-4117</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2009</creationdate><recordtype>article</recordtype><recordid>eNqFkU1LAzEQhoMoWKs_wFsuelvNx26zC15ErAoFL-p1meZDI9mkJlm1_95I9dRDLzMD87wvzLwInVJyQUlLLinpeN0w0hEmGCGc76EJbTirakrFfpnLvipAd4iOUnonhLacNhOkbo2x0mqfcdRD-ASHg8GrN-2DwyaGAX9B1hGPyfpXPNfskeOkByuDV6PMIWIJGdw6ZTx6VcDnF-wglcHGCMpCtsEfowMDLumTvz5Fz_Pbp5v7avF493Bzvagsr9tcCdaythyg-IwI0xmhO6OAgFCNaKkwsOyEnEkCdbNcSjUTkmgNWjRKydZoxqfofOO7iuFj1Cn3g01SOwdehzH1nM86xmi9E2SkZk3b_YJnfyAkCc5E8NKmfhXtAHHdM8rLJ0udIrHhrDchDvAVolN9hrUL8V-0FVGfv3NRXu1Uckr635S3LfgPOKqadQ</recordid><startdate>200904</startdate><enddate>200904</enddate><creator>Gondal, Mohammed A.</creator><creator>Sayeed, Mohammad N.</creator><creator>Yamani, Zain H.</creator><creator>Al-Arfaj, Abdul Rahman</creator><general>Taylor & Francis Group</general><general>Taylor & Francis</general><scope>IQODW</scope><scope>7TV</scope><scope>7U7</scope><scope>7UA</scope><scope>C1K</scope><scope>7SU</scope><scope>8FD</scope><scope>FR3</scope><scope>KR7</scope></search><sort><creationdate>200904</creationdate><title>Efficient removal of phenol from water using Fe2O3 semiconductor catalyst under UV laser irradiation</title><author>Gondal, Mohammed A. ; Sayeed, Mohammad N. ; Yamani, Zain H. ; Al-Arfaj, Abdul Rahman</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i348t-72828902d3607f9f7e9fda0a7d57817fab97c6c0a45bbcd67c0eeae75ddc8fe23</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2009</creationdate><topic>Applied sciences</topic><topic>Catalysts</topic><topic>clean water supplies</topic><topic>Exact sciences and technology</topic><topic>General purification processes</topic><topic>Irradiation</topic><topic>Lamps</topic><topic>laser applications</topic><topic>Lasers</topic><topic>organic pollutants</topic><topic>oxidation</topic><topic>Phenol</topic><topic>phenol removal</topic><topic>Photocatalysis</topic><topic>Pollution</topic><topic>Reaction kinetics</topic><topic>Semiconductors</topic><topic>TiO</topic><topic>wastewater treatment</topic><topic>Wastewaters</topic><topic>Water treatment and pollution</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Gondal, Mohammed A.</creatorcontrib><creatorcontrib>Sayeed, Mohammad N.</creatorcontrib><creatorcontrib>Yamani, Zain H.</creatorcontrib><creatorcontrib>Al-Arfaj, Abdul Rahman</creatorcontrib><collection>Pascal-Francis</collection><collection>Pollution Abstracts</collection><collection>Toxicology Abstracts</collection><collection>Water Resources Abstracts</collection><collection>Environmental Sciences and Pollution Management</collection><collection>Environmental Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Civil Engineering Abstracts</collection><jtitle>Journal of environmental science and health. Part A, Toxic/hazardous substances & environmental engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Gondal, Mohammed A.</au><au>Sayeed, Mohammad N.</au><au>Yamani, Zain H.</au><au>Al-Arfaj, Abdul Rahman</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Efficient removal of phenol from water using Fe2O3 semiconductor catalyst under UV laser irradiation</atitle><jtitle>Journal of environmental science and health. Part A, Toxic/hazardous substances & environmental engineering</jtitle><date>2009-04</date><risdate>2009</risdate><volume>44</volume><issue>5</issue><spage>515</spage><epage>521</epage><pages>515-521</pages><issn>1093-4529</issn><eissn>1532-4117</eissn><abstract>Efficient removal of phenol was carried out using laser induced photocatalyis process in the presence of Fe
2
O
3
semiconductor catalysts, and under UV laser irradiation. Parametric dependence of the removal process was investigated carefully by variation of laser irradiation time, laser energy, and concentration of the catalysts. pH measurements were also carried out to understand the photocatalytic process for removal of phenol. Maximum phenol removal achieved in this process was more than 90% during 1 hour of laser irradiation. This is considered highly efficient as compared to conventional setups using lamps. Reaction kinetics for the removal of phenol was also studied, and a reaction rate of 0.017 min
− 1
was estimated, following first order kinetics.</abstract><cop>Philadelphia, PA</cop><pub>Taylor & Francis Group</pub><doi>10.1080/10934520902720033</doi><tpages>7</tpages></addata></record> |
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ispartof | Journal of environmental science and health. Part A, Toxic/hazardous substances & environmental engineering, 2009-04, Vol.44 (5), p.515-521 |
issn | 1093-4529 1532-4117 |
language | eng |
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source | Taylor and Francis Science and Technology Collection |
subjects | Applied sciences Catalysts clean water supplies Exact sciences and technology General purification processes Irradiation Lamps laser applications Lasers organic pollutants oxidation Phenol phenol removal Photocatalysis Pollution Reaction kinetics Semiconductors TiO wastewater treatment Wastewaters Water treatment and pollution |
title | Efficient removal of phenol from water using Fe2O3 semiconductor catalyst under UV laser irradiation |
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