Electrons and the epitaxial growth of metals on alkali halides

Observations are reported of the epitaxial growth in UHV conditions of metal deposits upon (100) NaCl-type substrates in the systems KCl(100)/Ag, NaF(100)/Ag, Cu, Ni and MgO(100)/Ag, Cu, Ni. The effects are reported of low energy electron bombardment of the substrates before deposition of the metal....

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 1974-04, Vol.21 (2), p.341-356
Main Authors: Lord, D.G., Prutton, M.
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Observations are reported of the epitaxial growth in UHV conditions of metal deposits upon (100) NaCl-type substrates in the systems KCl(100)/Ag, NaF(100)/Ag, Cu, Ni and MgO(100)/Ag, Cu, Ni. The effects are reported of low energy electron bombardment of the substrates before deposition of the metal. The results are taken together with those of a number of other observers and compared with the critical accommodation model of epitaxy. This model is found to provide a good initial guide for predicting whether or not epitaxy will occur in these systems if chemical bonding and interfacial anisotropy are taken into account. The detailed natures of the centres produced by electron bombardment of the substrates are considered and a new defect, the surface Ag - centre (or BS-centre), is proposed to account for epitaxial orientation in the KCl(100)/Ag system after electron bombardment.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(74)90120-5