Process diagnostics in PIAD: tracing plasma fluctuations and drifts

Malobabic et al discuss process diagnostics in plasma-ion-assisted deposition (PIAD) which is a common method for manufacturing high-end coatings. PIAD is combination of conventional electron-beam evaporation and a plasma assist source targeted directly at the surface of the substrates. The bombardm...

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Bibliographic Details
Published in:Laser focus world 2019-06, Vol.55 (6), p.63
Main Authors: Malobabic, Sina, Harhausen, Jens, Oberberg, Moritz, Foest, Rüdiger, Mechold, Lars, Awakowicz, Peter, Brinkmann, Ralf Peter
Format: Magazinearticle
Language:English
Subjects:
Adatoms
Electron beams
Evaporation
Ion beam assisted deposition
Ion bombardment
Manufacturing
Nuclear weapons
Protective coatings
Substrates
Thin films
Variation
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Summary:Malobabic et al discuss process diagnostics in plasma-ion-assisted deposition (PIAD) which is a common method for manufacturing high-end coatings. PIAD is combination of conventional electron-beam evaporation and a plasma assist source targeted directly at the surface of the substrates. The bombardment of the adatoms (atoms adhering to the surface) by fast ions and neutrals during deposition increases their mobility and improves layer quality through an energetically advantageous position as the thin film grows.
ISSN:1043-8092