The Fourier analysis of the x-ray diffraction profiles obtained from sputtered tantalum films

A method using Fourier analysis of the X-ray diffraction profile is proposed for estimating the nitrogen content in sputtered tantalum films. The results obtained from computer simulation of a two-crystalline system consisting of b.c.c. tantalum and tantalum nitride revealed that the third harmonics...

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Bibliographic Details
Published in:Thin solid films 1977-06, Vol.43 (3), p.235-241
Main Authors: Koike, Ryu-Taro, Shintani, Masahiko
Format: Article
Language:English
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Summary:A method using Fourier analysis of the X-ray diffraction profile is proposed for estimating the nitrogen content in sputtered tantalum films. The results obtained from computer simulation of a two-crystalline system consisting of b.c.c. tantalum and tantalum nitride revealed that the third harmonics of the Fourier components (derived from the diffraction profile of the Cu Kα characteristic ray for 2 θ = 30−45°) could possibly be used as a measure of the nitrogen content of the films. The experimental results confirmed this, and the temperature coefficient of resistance of the films plotted as a function of the third Fourier component showed a plateau region for a Fourier component from −0.1 to +0.6.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(77)90284-X