Controlled spacing between nano-patterned regions in block copolymer films obtained by utilizing substrate topography for local film thickness differentiation

Various types of devices require hierarchically nano-patterned substrates, where spacing between patterned domains is controlled. Ultra-confined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Her...

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Bibliographic Details
Published in:ACS applied materials & interfaces 2019-09
Main Authors: Michman, Elisheva, Langenberg, Marcel, Stenger, Roland, Oded, Meirav, Schvartzman, Mark, Mueller, Marcus, Shenhar, Roy
Format: Article
Language:English
Online Access:Get full text
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Summary:Various types of devices require hierarchically nano-patterned substrates, where spacing between patterned domains is controlled. Ultra-confined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns, and thus opens numerous possibilities for hierarchical construction of multifunctional devices.
ISSN:1944-8252
DOI:10.1021/acsami.9b12817