Controlled spacing between nano-patterned regions in block copolymer films obtained by utilizing substrate topography for local film thickness differentiation

Various types of devices require hierarchically nano-patterned substrates, where spacing between patterned domains is controlled. Ultra-confined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Her...

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Published in:ACS applied materials & interfaces 2019-09
Main Authors: Michman, Elisheva, Langenberg, Marcel, Stenger, Roland, Oded, Meirav, Schvartzman, Mark, Mueller, Marcus, Shenhar, Roy
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container_title ACS applied materials & interfaces
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creator Michman, Elisheva
Langenberg, Marcel
Stenger, Roland
Oded, Meirav
Schvartzman, Mark
Mueller, Marcus
Shenhar, Roy
description Various types of devices require hierarchically nano-patterned substrates, where spacing between patterned domains is controlled. Ultra-confined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns, and thus opens numerous possibilities for hierarchical construction of multifunctional devices.
doi_str_mv 10.1021/acsami.9b12817
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fullrecord <record><control><sourceid>proquest_pubme</sourceid><recordid>TN_cdi_proquest_miscellaneous_2284560833</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2284560833</sourcerecordid><originalsourceid>FETCH-LOGICAL-p568-fb1bf2e23646c44aecb3f6ff39e581ffde60786deac6edf598dddc633f2e95363</originalsourceid><addsrcrecordid>eNo1kDtPwzAUhS0kRKGwMiKPLIHYTowzooqXVImle-XHdWvq2MF2hMqP4bcSoEx3ON_5jnQRuiT1DakpuZU6y97ddIpQQe6O0CnpmqYStKUzdJbzW11zRuv2BM0YaQTlnThFX4sYSoreg8F5kNqFDVZQPgACDjLEapClQApTnGDjYsjYBax81Dus4xD9voeErfN9xlEV6X5Itcdjcd59_tjyqHJJsgAuE79JctjusY0JTw7pf6u4bJ3eBcgZG2ctJAjFyTKtnaNjK32Gi8Odo9Xjw2rxXC1fn14W98tqaLmorCLKUqCMN1w3jQStmOXWsg5aQaw1wOs7wQ1IzcHYthPGGM0Zm0pdyzibo-s_7ZDi-wi5rHuXNXgvA8QxrykVTctrwdiEXh3QUfVg1kNyvUz79f9L2TeQk33h</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2284560833</pqid></control><display><type>article</type><title>Controlled spacing between nano-patterned regions in block copolymer films obtained by utilizing substrate topography for local film thickness differentiation</title><source>American Chemical Society:Jisc Collections:American Chemical Society Read &amp; Publish Agreement 2022-2024 (Reading list)</source><creator>Michman, Elisheva ; Langenberg, Marcel ; Stenger, Roland ; Oded, Meirav ; Schvartzman, Mark ; Mueller, Marcus ; Shenhar, Roy</creator><creatorcontrib>Michman, Elisheva ; Langenberg, Marcel ; Stenger, Roland ; Oded, Meirav ; Schvartzman, Mark ; Mueller, Marcus ; Shenhar, Roy</creatorcontrib><description>Various types of devices require hierarchically nano-patterned substrates, where spacing between patterned domains is controlled. Ultra-confined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns, and thus opens numerous possibilities for hierarchical construction of multifunctional devices.</description><identifier>EISSN: 1944-8252</identifier><identifier>DOI: 10.1021/acsami.9b12817</identifier><identifier>PMID: 31482698</identifier><language>eng</language><publisher>United States</publisher><ispartof>ACS applied materials &amp; interfaces, 2019-09</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27923,27924</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/31482698$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Michman, Elisheva</creatorcontrib><creatorcontrib>Langenberg, Marcel</creatorcontrib><creatorcontrib>Stenger, Roland</creatorcontrib><creatorcontrib>Oded, Meirav</creatorcontrib><creatorcontrib>Schvartzman, Mark</creatorcontrib><creatorcontrib>Mueller, Marcus</creatorcontrib><creatorcontrib>Shenhar, Roy</creatorcontrib><title>Controlled spacing between nano-patterned regions in block copolymer films obtained by utilizing substrate topography for local film thickness differentiation</title><title>ACS applied materials &amp; interfaces</title><addtitle>ACS Appl Mater Interfaces</addtitle><description>Various types of devices require hierarchically nano-patterned substrates, where spacing between patterned domains is controlled. Ultra-confined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns, and thus opens numerous possibilities for hierarchical construction of multifunctional devices.</description><issn>1944-8252</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><recordid>eNo1kDtPwzAUhS0kRKGwMiKPLIHYTowzooqXVImle-XHdWvq2MF2hMqP4bcSoEx3ON_5jnQRuiT1DakpuZU6y97ddIpQQe6O0CnpmqYStKUzdJbzW11zRuv2BM0YaQTlnThFX4sYSoreg8F5kNqFDVZQPgACDjLEapClQApTnGDjYsjYBax81Dus4xD9voeErfN9xlEV6X5Itcdjcd59_tjyqHJJsgAuE79JctjusY0JTw7pf6u4bJ3eBcgZG2ctJAjFyTKtnaNjK32Gi8Odo9Xjw2rxXC1fn14W98tqaLmorCLKUqCMN1w3jQStmOXWsg5aQaw1wOs7wQ1IzcHYthPGGM0Zm0pdyzibo-s_7ZDi-wi5rHuXNXgvA8QxrykVTctrwdiEXh3QUfVg1kNyvUz79f9L2TeQk33h</recordid><startdate>20190904</startdate><enddate>20190904</enddate><creator>Michman, Elisheva</creator><creator>Langenberg, Marcel</creator><creator>Stenger, Roland</creator><creator>Oded, Meirav</creator><creator>Schvartzman, Mark</creator><creator>Mueller, Marcus</creator><creator>Shenhar, Roy</creator><scope>NPM</scope><scope>7X8</scope></search><sort><creationdate>20190904</creationdate><title>Controlled spacing between nano-patterned regions in block copolymer films obtained by utilizing substrate topography for local film thickness differentiation</title><author>Michman, Elisheva ; Langenberg, Marcel ; Stenger, Roland ; Oded, Meirav ; Schvartzman, Mark ; Mueller, Marcus ; Shenhar, Roy</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p568-fb1bf2e23646c44aecb3f6ff39e581ffde60786deac6edf598dddc633f2e95363</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Michman, Elisheva</creatorcontrib><creatorcontrib>Langenberg, Marcel</creatorcontrib><creatorcontrib>Stenger, Roland</creatorcontrib><creatorcontrib>Oded, Meirav</creatorcontrib><creatorcontrib>Schvartzman, Mark</creatorcontrib><creatorcontrib>Mueller, Marcus</creatorcontrib><creatorcontrib>Shenhar, Roy</creatorcontrib><collection>PubMed</collection><collection>MEDLINE - Academic</collection><jtitle>ACS applied materials &amp; interfaces</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Michman, Elisheva</au><au>Langenberg, Marcel</au><au>Stenger, Roland</au><au>Oded, Meirav</au><au>Schvartzman, Mark</au><au>Mueller, Marcus</au><au>Shenhar, Roy</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Controlled spacing between nano-patterned regions in block copolymer films obtained by utilizing substrate topography for local film thickness differentiation</atitle><jtitle>ACS applied materials &amp; interfaces</jtitle><addtitle>ACS Appl Mater Interfaces</addtitle><date>2019-09-04</date><risdate>2019</risdate><eissn>1944-8252</eissn><abstract>Various types of devices require hierarchically nano-patterned substrates, where spacing between patterned domains is controlled. Ultra-confined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns, and thus opens numerous possibilities for hierarchical construction of multifunctional devices.</abstract><cop>United States</cop><pmid>31482698</pmid><doi>10.1021/acsami.9b12817</doi></addata></record>
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title Controlled spacing between nano-patterned regions in block copolymer films obtained by utilizing substrate topography for local film thickness differentiation
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T21%3A05%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_pubme&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Controlled%20spacing%20between%20nano-patterned%20regions%20in%20block%20copolymer%20films%20obtained%20by%20utilizing%20substrate%20topography%20for%20local%20film%20thickness%20differentiation&rft.jtitle=ACS%20applied%20materials%20&%20interfaces&rft.au=Michman,%20Elisheva&rft.date=2019-09-04&rft.eissn=1944-8252&rft_id=info:doi/10.1021/acsami.9b12817&rft_dat=%3Cproquest_pubme%3E2284560833%3C/proquest_pubme%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-p568-fb1bf2e23646c44aecb3f6ff39e581ffde60786deac6edf598dddc633f2e95363%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2284560833&rft_id=info:pmid/31482698&rfr_iscdi=true