Holographic lithography with thick photoresist

Gratings with periods as fine as 199 nm and height-to-width ratios ∼5:1 have been produced directly in photoresist by holographic lithography using a technique that reduces ‘‘orthogonal standing wave’’ problems. The technique uses a single layer of photoresist to attenuate the ‘‘orthogonal standing...

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Bibliographic Details
Published in:Applied physics letters 1983-01, Vol.43 (9), p.874-875
Main Authors: ANDERSON, E. H, HORWITZ, C. M, SMITH, H. I
Format: Article
Language:English
Subjects:
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Gratings
Optical elements, devices, and systems
Optics
Physics
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Summary:Gratings with periods as fine as 199 nm and height-to-width ratios ∼5:1 have been produced directly in photoresist by holographic lithography using a technique that reduces ‘‘orthogonal standing wave’’ problems. The technique uses a single layer of photoresist to attenuate the ‘‘orthogonal standing wave,’’ as well as record the grating pattern. The technique is tolerant of process variations and produces structures suitable for further processing steps such as liftoff and etching.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.94533