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Investigation of lasing in lead vapor by the double pulse method
The double pulse method was to study the 722.9 nm line emitted by a lead vapor laser. The parameters of the second excitation pulse were measured simultaneously with the lasing characteristics. It was found that the main factor determining a decrease in the laser output power in the second pulse was...
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Published in: | Soviet journal of quantum electronics 1983-05, Vol.13 (5), p.598-603 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Online Access: | Get full text |
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Summary: | The double pulse method was to study the 722.9 nm line emitted by a lead vapor laser. The parameters of the second excitation pulse were measured simultaneously with the lasing characteristics. It was found that the main factor determining a decrease in the laser output power in the second pulse was the residual population of the lower active level. Variations in the excitation pulse had a relatively weak influence on the form of this dependence and were essentially manifested when there was a relatively long delay between the excitation pulses. |
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ISSN: | 0049-1748 2169-530X |
DOI: | 10.1070/QE1983v013n05ABEH004233 |