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Magnetoresistance behavior in microfabricated trilayer strip pattern
This paper reports a highly sensitive GMR behavior observed in a microstructured Ni78Fe22/Cu/Co trilayer strip pattern deposited by the electron beam evaporation method. The MR ratio of 3.2% for an applied field of 20 Oe was obtained at room temperature. The superior selective switching of the magne...
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Published in: | Journal of magnetism and magnetic materials 1996-04, Vol.156 (1-3), p.301-302 |
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Language: | English |
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container_end_page | 302 |
container_issue | 1-3 |
container_start_page | 301 |
container_title | Journal of magnetism and magnetic materials |
container_volume | 156 |
creator | Matsuyama, K. Asada, H. Ikeda, S. Chida, I. |
description | This paper reports a highly sensitive GMR behavior observed in a microstructured Ni78Fe22/Cu/Co trilayer strip pattern deposited by the electron beam evaporation method. The MR ratio of 3.2% for an applied field of 20 Oe was obtained at room temperature. The superior selective switching of the magnetizations in the two magnetic layers has been confirmed by the MR behavior in a rotating magnetic field. |
doi_str_mv | 10.1016/0304-8853(95)00876-4 |
format | article |
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title | Magnetoresistance behavior in microfabricated trilayer strip pattern |
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