Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography

We developed an improved self-assembly method to obtain a large-area, high-quality templated monolayer mask using the polystyrene spheres. On the basis of the templated mask, hierarchically ordered Si metastructures with different nanosteps are fabricated using cyclic inductively coupled plasma etch...

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Published in:ACS applied materials & interfaces 2020-03, Vol.12 (10), p.12345-12352
Main Authors: Fang, Xiaoguo, Zheng, Changxiong, Yin, Zhen, Wang, Zhenming, Wang, Jiawei, Liu, Jianxun, Luo, Dan, Liu, Yan Jun
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container_title ACS applied materials & interfaces
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creator Fang, Xiaoguo
Zheng, Changxiong
Yin, Zhen
Wang, Zhenming
Wang, Jiawei
Liu, Jianxun
Luo, Dan
Liu, Yan Jun
description We developed an improved self-assembly method to obtain a large-area, high-quality templated monolayer mask using the polystyrene spheres. On the basis of the templated mask, hierarchically ordered Si metastructures with different nanosteps are fabricated using cyclic inductively coupled plasma etching technique. By evaporating a thin gold capping layer on these Si metastructures, their optical properties are comparatively studied using the surface-enhanced Raman scattering spectroscopy. Our proposed technique is highly promising for fabricating a variety of periodic three-dimensional hierarchically ordered metastructures, which could be further utilized for applications in SERS-based biosensors, optical absorbers, metamaterial/metasurface devices, etc.
doi_str_mv 10.1021/acsami.9b22932
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title Hierarchically Ordered Silicon Metastructures from Improved Self-Assembly-Based Nanosphere Lithography
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