Effect of Dispersion Forces on the Adhesion of Continuous Metallic Films on Amorphous Carbon or Silicon Substrates

The Van der Waals adhesion of metallic film is calculated using the macroscopic theory of Lifshitz for Ag, Al, Cu, and Au films deposited onto C films or Si substrates. When the residual pressure of the deposition is low enough to approximate the interfacial zone to a vacuum, most of the calculated...

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Bibliographic Details
Published in:Thin solid films 1980-04, Vol.67 (1), p.61-71
Main Authors: Desrousseaux, G, Carlan, A, Varnier, F
Format: Article
Language:fre
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Summary:The Van der Waals adhesion of metallic film is calculated using the macroscopic theory of Lifshitz for Ag, Al, Cu, and Au films deposited onto C films or Si substrates. When the residual pressure of the deposition is low enough to approximate the interfacial zone to a vacuum, most of the calculated values lead to the recognition of a variable thickness z of this zone. The thickness z only tends towards the interatomic distance zo within the film and substrate on a fraction So/S approx = 1/100 of the interfacial area. In contrast, if the interface consists of water molecules in a pseudo-liquid phase, a constant thickness of a few monolayers can be expected. 12 ref.--AA
ISSN:0040-6090