Field-assisted photoemission to 2.1 microns from a Ag/ p -In0.77Ga0.23As photocathode
Reflection-mode photoemission to a 2.1-μm threshold has been achieved from an externally biased Ag/p-In0.77Ga0.23As cathode. Quantum yield at 1.9 μm is 2×10−3 electrons per incident photon for 2.4-V bias and a cathode cooled to ∼125 K. The cathode was grown by vapor-phase epitaxy on a compositionall...
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Published in: | Applied physics letters 1980-04, Vol.36 (8), p.639-640 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Reflection-mode photoemission to a 2.1-μm threshold has been achieved from an externally biased Ag/p-In0.77Ga0.23As cathode. Quantum yield at 1.9 μm is 2×10−3 electrons per incident photon for 2.4-V bias and a cathode cooled to ∼125 K. The cathode was grown by vapor-phase epitaxy on a compositionally graded InAsP on InP (100) substrate using the hydride process. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.91608 |