Measurements of submicron hole diffusion lengths in GaAs by a photovoltaic technique

A simple technique for measuring submicron diffusion lengths in semiconductors is described. It consists, basically, in measuring the photocurrent of a Schottky barrier as a function of applied reverse bias. The modification of the photoresponse due to electroabsorption effects in the barrier region...

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Bibliographic Details
Published in:Applied physics letters 1981-03, Vol.38 (6), p.442-444
Main Authors: Dorantes-Dávila, J., Lastras-Martínez, A., Raccah, P. M.
Format: Article
Language:English
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Summary:A simple technique for measuring submicron diffusion lengths in semiconductors is described. It consists, basically, in measuring the photocurrent of a Schottky barrier as a function of applied reverse bias. The modification of the photoresponse due to electroabsorption effects in the barrier region has to be taken into account and is discussed here. The diffusion length of n-type GaAs doped at a concentration of 2.7×1017/cm3 is found to be 0.23 mm.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.92390