Optical and luminescent properties of ion-implanted films

• Published in: Thin solid films 1980-03, Vol.66 (3), p.255-259
• Main Authors: Litovchenko, V.G., Zuev, V.A., Korbutyak, D.V., Gavrilenko, V.I.
• Format: Article
• Language: English
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/0040-6090(80)90379-X

It has been shown that band parameters for unimplanted films differ from those for bulk materials. Mechanical stresses and increased concentrations of defects seem to be responsible for this difference. The neighbourhood of the surface and the existence of drain paths for bulk defects determine the activity of the surface as a collector for mobile defects and hence their accumulation and their subsequent combination and annihilation reactions. From this point of view ion-implanted films with radiation-induced defects exhibit specific types of behaviour. For example, low energy ion bombardment (together with the removal of a very thin surface layer by etching) leads to an extensive movement of defects towards the surface and to a purification of the corresponding layer. In a number of cases even structural phase transformations take place within the surface layer, which lead in particular to the creation of surface excitons. High energy ion bombardment does not alter the band parameters of the films at the depth d of ion penetration but distorts the structure at the surface owing to a drain of defects into this layer. At the same time centres of scattering and radiative recombination are effectively induced at the depth d.