Structure and Electrical Properties of Amorphous Ni--P Thin Films

Amorphous Ni--P films were prepared by electroless deposition. Electrical properties (sheet resistivity and temperature coefficient) of the resistance layer deposited on ceramic and glass substrates under various conditions were determined. The structure and morphology of the films were investigated...

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Bibliographic Details
Published in:Vacuum 1981-10, Vol.33 (1-2), p.35-41
Main Authors: Besenyei, E, Zsoldos, B, Geszti, O
Format: Article
Language:English
Online Access:Get full text
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Summary:Amorphous Ni--P films were prepared by electroless deposition. Electrical properties (sheet resistivity and temperature coefficient) of the resistance layer deposited on ceramic and glass substrates under various conditions were determined. The structure and morphology of the films were investigated by transmission electron microscopy and electron diffraction. A relationship was found between the structure and the electrical properties. In addition the effect of annealing, carried out at different temperatures, on the electrical properties of the resistance layer was studied. 10 ref.--AA
ISSN:0042-207X