Metallurgy and microfabrication applications of gold-silicon-beryllium liquid-metal field-ion sources

The gold-silicon-beryllium liquid-metal field-ion emitter is a particularly versatile source for focused ion beam microlithography systems, since it can provide both p-type and n-type dopants for gallium arsenide. A metallurgical study of this alloy system provides a basis for the choice of composit...

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Bibliographic Details
Published in:Microelectronic engineering 1986-12, Vol.5 (1), p.171-178
Main Authors: Reich, D.F., Fray, D.J., Evason, A.F., Cleaver, J.R.A., Ahmed, H.
Format: Article
Language:English
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Summary:The gold-silicon-beryllium liquid-metal field-ion emitter is a particularly versatile source for focused ion beam microlithography systems, since it can provide both p-type and n-type dopants for gallium arsenide. A metallurgical study of this alloy system provides a basis for the choice of composition that gives a good compromise between the yield of required ions and the source operating temperature and lifetime. Alloys have been evaluated and utilized in a scanning ion beam lithography system for implantation and for resist exposure.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(86)90044-4