Feasibility of multi-beam electron lithography

The achievable throughput of a high-resolution electron-beam pattern generator in which a matrix of 1000 individually blankable 0.1-μm-sized pixels is scanned in a raster should be about 0.5 cm 2/s. This is an order of magnitude greater than for the best existing shaped-beam vector-scan machine. The...

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Bibliographic Details
Published in:Microelectronic engineering 1984, Vol.2 (4), p.259-279
Main Authors: Roelofs, B.J.G.M., Barth, J.E.
Format: Article
Language:English
Subjects:
EBPG writing speed
electron optics
Electron-beam lithography
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Summary:The achievable throughput of a high-resolution electron-beam pattern generator in which a matrix of 1000 individually blankable 0.1-μm-sized pixels is scanned in a raster should be about 0.5 cm 2/s. This is an order of magnitude greater than for the best existing shaped-beam vector-scan machine. The matrix could be formed by splitting a solid beam into beamlets which pass through an array of blankers. The beam splitter and array optics can be corrected for spherical aberration so that all the beamlets can be brought together at the entrance to the projection/deflection system.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(84)90005-4