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Sputtering parameters affecting the corrosion resistance of CoCrPtTa thin film media
Corrosion resistance of CoCrPtTa thin film media under high temperature and humidity environment (60°C, 80 RH) was investigated. Effects of sputtering parameters, such as film thickness, Ar pressure, substrate bias, protective layer thickness and composition were studied. It is shown that Cr underla...
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Published in: | Journal of magnetism and magnetic materials 2000-02, Vol.209 (1), p.157-159 |
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container_title | Journal of magnetism and magnetic materials |
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creator | Tsai, Changdar Liang, James Liang, H.H Wang, C.M |
description | Corrosion resistance of CoCrPtTa thin film media under high temperature and humidity environment (60°C, 80
RH) was investigated. Effects of sputtering parameters, such as film thickness, Ar pressure, substrate bias, protective layer thickness and composition were studied. It is shown that Cr underlayer thickness and Ar pressure play important roles in the suppression of Co corrosion. |
doi_str_mv | 10.1016/S0304-8853(99)00674-5 |
format | article |
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subjects | Applied sciences Condensed matter: electronic structure, electrical, magnetic, and optical properties Corrosion Corrosion environments Exact sciences and technology Magnetic properties and materials Magnetic recording materials Metals. Metallurgy Physics Sputtering parameters Studies of specific magnetic materials Thin film media |
title | Sputtering parameters affecting the corrosion resistance of CoCrPtTa thin film media |
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