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Sputtering parameters affecting the corrosion resistance of CoCrPtTa thin film media

Corrosion resistance of CoCrPtTa thin film media under high temperature and humidity environment (60°C, 80 RH) was investigated. Effects of sputtering parameters, such as film thickness, Ar pressure, substrate bias, protective layer thickness and composition were studied. It is shown that Cr underla...

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Published in:Journal of magnetism and magnetic materials 2000-02, Vol.209 (1), p.157-159
Main Authors: Tsai, Changdar, Liang, James, Liang, H.H, Wang, C.M
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Wang, C.M
description Corrosion resistance of CoCrPtTa thin film media under high temperature and humidity environment (60°C, 80 RH) was investigated. Effects of sputtering parameters, such as film thickness, Ar pressure, substrate bias, protective layer thickness and composition were studied. It is shown that Cr underlayer thickness and Ar pressure play important roles in the suppression of Co corrosion.
doi_str_mv 10.1016/S0304-8853(99)00674-5
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subjects Applied sciences
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Corrosion
Corrosion environments
Exact sciences and technology
Magnetic properties and materials
Magnetic recording materials
Metals. Metallurgy
Physics
Sputtering parameters
Studies of specific magnetic materials
Thin film media
title Sputtering parameters affecting the corrosion resistance of CoCrPtTa thin film media
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