Micrometer patterning using synchrotron radiation and the polyaniline - PVC blend

In the present work we investigated the localized photodoping process of polyaniline‐emeraldine base/poly(vinylchloride) blends by high‐energy photons from a synchrotron source. The doped blend was characterized using optical and electrical parameters. An abrupt increase of conductivity by four orde...

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Published in:Advanced materials for optics and electronics 2000-11, Vol.10 (6), p.241-244
Main Authors: Carinhana Jr, D, De Paoli, M.-A, de Castro, C. S. C, de Souza, G. G. B
Format: Article
Language:English
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photodoping
photolithography
polyaniline blend
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container_title Advanced materials for optics and electronics
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creator Carinhana Jr, D
De Paoli, M.-A
de Castro, C. S. C
de Souza, G. G. B
description In the present work we investigated the localized photodoping process of polyaniline‐emeraldine base/poly(vinylchloride) blends by high‐energy photons from a synchrotron source. The doped blend was characterized using optical and electrical parameters. An abrupt increase of conductivity by four orders of magnitude (10−10 to 10−6 Scm−1) was observed using an initial dose of 500 Jcm−3. Lithographic patterns were recorded with micrometer resolution. Copyright © 2000 John Wiley & Sons, Ltd.
doi_str_mv 10.1002/1099-0712(200011/12)10:6<241::AID-AMO415>3.0.CO;2-S
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subjects photodoping
photolithography
polyaniline blend
title Micrometer patterning using synchrotron radiation and the polyaniline - PVC blend
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