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Temperature and intensity dependence of photorefractive effect in GaAs
The photorefractive effect in semi-insulating Cr-doped GaAs as measured by the beam coupling technique was investigated as functions of temperature (295-386 K) and intensity (0.15-98 mW/sq cm of 1.15-micron light beams from a He-Ne laser). Results show that the photorefractive effect deteriorates ra...
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Published in: | Applied physics letters 1986-11, Vol.49 (21), p.1456-1458 |
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container_title | Applied physics letters |
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creator | Cheng, Li-Jen Partovi, Afshin |
description | The photorefractive effect in semi-insulating Cr-doped GaAs as measured by the beam coupling technique was investigated as functions of temperature (295-386 K) and intensity (0.15-98 mW/sq cm of 1.15-micron light beams from a He-Ne laser). Results show that the photorefractive effect deteriorates rapidly over a narrow range of temperature as temperature rises, and that this characteristic temperature increases with the logarithm of beam intensity. The observed phenomenon is attributed to the competing effects of the dark- and light-induced conductivities. |
doi_str_mv | 10.1063/1.97301 |
format | article |
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subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Exact sciences and technology Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of bulk materials and thin films Physics Solid-State Physics |
title | Temperature and intensity dependence of photorefractive effect in GaAs |
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