Wear properties of tetrahedrally bonded amorphous thin films

The abrasion wear rates of amorphous carbon, silicon, germanium and SiN x films have been measured. The wear rate of all these films is shown to depend systematically on the amount of hydrogen incorporated in the film during the deposition process (either plasma or ion beam sputter deposition). This...

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Bibliographic Details
Published in:Thin solid films 1986-07, Vol.140 (2), p.227-235
Main Authors: Jansen, F., Machonkin, M.A.
Format: Article
Language:English
Subjects:
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Physical properties of thin films, nonelectronic
Physics
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
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Summary:The abrasion wear rates of amorphous carbon, silicon, germanium and SiN x films have been measured. The wear rate of all these films is shown to depend systematically on the amount of hydrogen incorporated in the film during the deposition process (either plasma or ion beam sputter deposition). This dependence can be understood from a decrease in the degree of cross-linking of the amorphous network when hydrogen is increasingly incorporated in the film. The resistance of unhydrogenated films to abrasive wear correlates with the atomic bond strengths of these materials, decreasing in the order carbon, SiN x , silicon, germanium. The wear properties of SiN x films depend on the incorporated hydrogen as well as on the NSi composition of the films.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(86)90266-X