Chloride ion penetration into oxide films on aluminum: Auger and XPS studies

The analyses of the oxide films on Al in chloride solutions clearly show that the concentration profile of Cl exp -- ions in the film and the anodic behavior of Al are strongly correlated in such a way that fast anodic dissolution with practically negligible additional anodic polarization is observe...

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Bibliographic Details
Published in:Journal of electroanalytical chemistry and interfacial electrochemistry 1985-01, Vol.182 (1), p.179-186
Main Authors: Atanasoska, Lj.D., Dražić, D.M., Despić, A.R., Zalar, A.
Format: Article
Language:English
Subjects:
Adsorption
Chemistry
Electrochemistry
Electrodeposition
Exact sciences and technology
General and physical chemistry
Study of interfaces
Transport phenomena
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Summary:The analyses of the oxide films on Al in chloride solutions clearly show that the concentration profile of Cl exp -- ions in the film and the anodic behavior of Al are strongly correlated in such a way that fast anodic dissolution with practically negligible additional anodic polarization is observed only with the samples when Cl exp -- ions have penetrated throughout the whole film thickness. On the other hand, absorption of Cl exp -- ions in the film appeared to be potential-dependent. All these findings support the earlier proposal that the electric field inversion caused by the accumulation of negatively charged Cl exp -- ion triggers the fast anodic dissolution, practically without the polarization. 23 ref.--AA(US).
ISSN:0022-0728
DOI:10.1016/0368-1874(85)85451-4