Maximum thickness of amorphous NiZr interlayers formed by a solid-state reaction technique

Formation of the equilibrium intermetallic compound NiZr in sputter deposited Ni/Zr diffusion couples is suppressed by the formation of a metastable amorphous NiZr alloy until a critical thickness of the amorphous NiZr interlayer is reached. The temperature dependence of this critical thickness is s...

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Bibliographic Details
Published in:Applied physics letters 1987-11, Vol.51 (21), p.1693-1695
Main Authors: MENG, W. J, NIEH, C. W, JOHNSON, W. L
Format: Article
Language:English
Subjects:
Chemical interdiffusion
diffusion barriers
Condensed matter: structure, mechanical and thermal properties
Cross-disciplinary physics: materials science
rheology
Diffusion in solids
Exact sciences and technology
Materials science
Metals, semimetals and alloys
Other nonelectronic physical properties
Physical properties of thin films, nonelectronic
Physics
Specific materials
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Transport properties of condensed matter (nonelectronic)
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Summary:Formation of the equilibrium intermetallic compound NiZr in sputter deposited Ni/Zr diffusion couples is suppressed by the formation of a metastable amorphous NiZr alloy until a critical thickness of the amorphous NiZr interlayer is reached. The temperature dependence of this critical thickness is studied experimentally. A phenomenological model based on the premise of interfacial heterogeneous nucleation is proposed to understand the evolution of Ni/Zr diffusion couples.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.98546