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Diffused germanium dichroic mirror for optically pumped far-infrared lasers
A new type of dichroic reflector has been developed for the far-infrared region of the spectrum, based on n-type germanium with a diffused conduction layer. A 111-axis single-crystal plate of 40-Ω cm optical-grade germanium was implanted with 5×1014 As+ ions/cm2 by ion bombardment at 200 keV; the do...
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Published in: | Journal of applied physics 1985-11, Vol.58 (10), p.3708-3711 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | A new type of dichroic reflector has been developed for the far-infrared region of the spectrum, based on n-type germanium with a diffused conduction layer. A 111-axis single-crystal plate of 40-Ω cm optical-grade germanium was implanted with 5×1014 As+ ions/cm2 by ion bombardment at 200 keV; the donor impurity ions were subsequently diffused into the substrate at a temperature of 850 °C (held for 20 h). The measured power-reflection spectrum displayed a shallow minimum at ∼70 cm−1, rising steeply below 50 cm−1 to reach 80% reflectivity at 10 cm−1. Computer modeling of the infrared reflectance of a thermally diffused conducting layer in n-type germanium—with the assumption of Conwell–Weisskopf mobility variation for the conduction electrons—gave an excellent fit to the observed reflection spectrum for an integrated column density of 1014 cm−2 and 10-μm half width, the latter being in good agreement with the value √Dt=11 μm calculated for thermal diffusion under the conditions indicated. |
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ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.335633 |