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Diffused germanium dichroic mirror for optically pumped far-infrared lasers

A new type of dichroic reflector has been developed for the far-infrared region of the spectrum, based on n-type germanium with a diffused conduction layer. A 111-axis single-crystal plate of 40-Ω cm optical-grade germanium was implanted with 5×1014 As+ ions/cm2 by ion bombardment at 200 keV; the do...

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Bibliographic Details
Published in:Journal of applied physics 1985-11, Vol.58 (10), p.3708-3711
Main Authors: RUTT, H. N, SELDEN, A. C, MCNEIL, B. W, DENNING, R. G
Format: Article
Language:English
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Summary:A new type of dichroic reflector has been developed for the far-infrared region of the spectrum, based on n-type germanium with a diffused conduction layer. A 111-axis single-crystal plate of 40-Ω cm optical-grade germanium was implanted with 5×1014 As+ ions/cm2 by ion bombardment at 200 keV; the donor impurity ions were subsequently diffused into the substrate at a temperature of 850 °C (held for 20 h). The measured power-reflection spectrum displayed a shallow minimum at ∼70 cm−1, rising steeply below 50 cm−1 to reach 80% reflectivity at 10 cm−1. Computer modeling of the infrared reflectance of a thermally diffused conducting layer in n-type germanium—with the assumption of Conwell–Weisskopf mobility variation for the conduction electrons—gave an excellent fit to the observed reflection spectrum for an integrated column density of 1014 cm−2 and 10-μm half width, the latter being in good agreement with the value √Dt=11 μm calculated for thermal diffusion under the conditions indicated.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.335633