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Formation of drawing-induced E' centers in silica optical fibers
Using an electron spin resonance technique, E' centers have been observed in pure silica optical fibers fabricated under various drawing conditions. The E'-center concentration increases with increasing furnace temperature and drawing velocity. The influences of the temperature and velocit...
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Published in: | Japanese Journal of Applied Physics 1985-09, Vol.24 (9), p.1117-1121 |
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container_title | Japanese Journal of Applied Physics |
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creator | HIBINO, Y HANAFUSA, H SAKAGUCHI, S |
description | Using an electron spin resonance technique, E' centers have been observed in pure silica optical fibers fabricated under various drawing conditions. The E'-center concentration increases with increasing furnace temperature and drawing velocity. The influences of the temperature and velocity have been studied by considering the diameter and temperature distributions of a preform in the drawing furnace. The analysis indicates that the E' centers are frozen in the optical fibers by a thermal activation process in the furnace. The activation energy for the creation of the E' centers is determined as 3.5±0.5 eV, and the effective recombination density for the decay of the E' center as 6.2×10
-13
. Furthermore, the fictive temperature of the optical fibers is estimated to be more than 2100 K from the E'-center concentration. |
doi_str_mv | 10.1143/jjap.24.1117 |
format | article |
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-13
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-13
. Furthermore, the fictive temperature of the optical fibers is estimated to be more than 2100 K from the E'-center concentration.</description><subject>Applied sciences</subject><subject>Circuit properties</subject><subject>Electric, optical and optoelectronic circuits</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Integrated optics. Optical fibers and wave guides</subject><subject>Optical and optoelectronic circuits</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1985</creationdate><recordtype>article</recordtype><recordid>eNo9kE9Lw0AUxBdRsFZvfoA9iF5M3X_JJjdLadVS0IOew8vbXdmSJnE3Rfz2rrR4Gob3m4E3hFxzNuNcyYftFoaZUMlwfUImXCqdKVbkp2TCmOCZqoQ4JxcxbpMtcsUn5HHVhx2Mvu9o76gJ8O27z8x3Zo_W0OUdRduNNkTqOxp96xFoP4xJWup8kw6X5MxBG-3VUafkY7V8Xzxnm9enl8V8k6EsyzErMEeLWGDTuAa4tVqWaBAdSieEgJwbYBw0YwZ0UxW5LCQ3GhqlbclNKafk9tA7hP5rb-NY73xE27bQ2X4fa6HylFJVAu8PIIY-xmBdPQS_g_BTc1b_zVSv1_O3xNd_MyX85tgLMX3lAnTo43-m1JVSeSl_AVHDaDo</recordid><startdate>19850901</startdate><enddate>19850901</enddate><creator>HIBINO, Y</creator><creator>HANAFUSA, H</creator><creator>SAKAGUCHI, S</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19850901</creationdate><title>Formation of drawing-induced E' centers in silica optical fibers</title><author>HIBINO, Y ; HANAFUSA, H ; SAKAGUCHI, S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c388t-6c5cecc6cbbfba1ee738cdccfc3f222a51da01a700da7b9653631d7ab47e81d83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1985</creationdate><topic>Applied sciences</topic><topic>Circuit properties</topic><topic>Electric, optical and optoelectronic circuits</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Integrated optics. Optical fibers and wave guides</topic><topic>Optical and optoelectronic circuits</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>HIBINO, Y</creatorcontrib><creatorcontrib>HANAFUSA, H</creatorcontrib><creatorcontrib>SAKAGUCHI, S</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>HIBINO, Y</au><au>HANAFUSA, H</au><au>SAKAGUCHI, S</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Formation of drawing-induced E' centers in silica optical fibers</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1985-09-01</date><risdate>1985</risdate><volume>24</volume><issue>9</issue><spage>1117</spage><epage>1121</epage><pages>1117-1121</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>Using an electron spin resonance technique, E' centers have been observed in pure silica optical fibers fabricated under various drawing conditions. The E'-center concentration increases with increasing furnace temperature and drawing velocity. The influences of the temperature and velocity have been studied by considering the diameter and temperature distributions of a preform in the drawing furnace. The analysis indicates that the E' centers are frozen in the optical fibers by a thermal activation process in the furnace. The activation energy for the creation of the E' centers is determined as 3.5±0.5 eV, and the effective recombination density for the decay of the E' center as 6.2×10
-13
. Furthermore, the fictive temperature of the optical fibers is estimated to be more than 2100 K from the E'-center concentration.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.24.1117</doi><tpages>5</tpages></addata></record> |
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source | Institute of Physics IOPscience extra; Institute of Physics:Jisc Collections:IOP Publishing Read and Publish 2024-2025 (Reading List) |
subjects | Applied sciences Circuit properties Electric, optical and optoelectronic circuits Electronics Exact sciences and technology Integrated optics. Optical fibers and wave guides Optical and optoelectronic circuits |
title | Formation of drawing-induced E' centers in silica optical fibers |
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