Interaction of ultraviolet laser radiation with a XeCl laser

A significant enhancement (up to 30 percent) in the output pulse energy of a XeCl laser (Lambda = 308 nm) is observed when ultraviolet-laser radiation at 193, 248, or 351 nm is injected into the XeCl resonator before the emission of the 308-nm pulse. In each case, it appears that the enhancement hin...

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Bibliographic Details
Published in:Journal of the Optical Society of America. B, Optical physics Optical physics, 1985-06, Vol.2 (6), p.925-930
Main Authors: GEOHEGAN, D. B, MCCOWN, A. W, EDEN, J. G
Format: Article
Language:English
Subjects:
Exact sciences and technology
Fundamental areas of phenomenology (including applications)
Gas lasers including excimer and metal-vapor lasers
Lasers
Optics
Physics
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Summary:A significant enhancement (up to 30 percent) in the output pulse energy of a XeCl laser (Lambda = 308 nm) is observed when ultraviolet-laser radiation at 193, 248, or 351 nm is injected into the XeCl resonator before the emission of the 308-nm pulse. In each case, it appears that the enhancement hinges on the presence of impurity molecules (e.g., hydrocarbons, N2, O2) in the XeCl-laser-gas mixture. For Lambda (injected) = 193 and 248 nm, the external radiation appears to photoionize the impurity directly, whereas, at 351 nm, the impurity is photoexcited and subsequently ionized by the discharge. Strong absorption of 248-nm radiation by the XeCl active medium is observed during and following the XeCl discharge - an effect tnat is also attributed to impurities.
ISSN:0740-3224
1520-8540
DOI:10.1364/JOSAB.2.000925