High-Performance Vertical Organic Phototransistors Enhanced by Ferroelectrics

• Published in: ACS applied materials & interfaces 2021-01, Vol.13 (1), p.1035-1042
• Main Authors: Chen, Qizhen, Lai, Dengxiao, He, Lihua, Yujie Yan, Li, Enlong, Liu, Yaqian, Zeng, Huaan, Chen, Huipeng, Guo, Tailiang
• Format: Article
• Language: English
• ISSN: 1944-8244; 1944-8252
• DOI: 10.1021/acsami.0c18281

Organic phototransistors with high sensitivity and responsivity to light irradiance have great potential applications in national defense, meteorology, industrial manufacturing, and medical security. However, undesired dark current and photoresponsivity limit their practical applications. Here, a novel vertical organic phototransistor combined with ferroelectric materials is developed. The device structure has nanometer channel length, which can effectively separate photogenerated carriers and reduce the probability of carrier recombination and defect scattering, thus improving the device performance of phototransistors. Moreover, by inserting the poly(vinylidene fluoride- -trifluoroethylene) (P(VDF-TrFE)) ferroelectric layer, the Schottky barrier at the interface between the semiconductor and source can be adjusted by the polarization of the external electric field, which can effectively reduce the dark current of the phototransistor to further improve the device performance. Therefore, our phototransistors exhibit a high photoresponsivity of more than 5.7 × 10 A/W, an outstanding detectivity of 1.15 × 10 Jones, and an excellent photosensitivity of 5 × 10 under 760 nm light illumination, which are better than those of conventional lateral organic phototransistors. This work provides a new approach for the development of high-performance phototransistors, which opens a new pathway for organic phototransistors in practical application.