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Galvanostatic anodization of titanium—I. Structures and compositions of the anodic films
The galvanostatic anodization of commercially pure titanium is studied with current densities lower than 500 A m −2 in 1 M sulphuric acid between 25 and 75°C. Two types of electrochemical behaviour are observed: the first type is characterized by a maximum value of the cell voltage and the second on...
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Published in: | Electrochimica acta 1988-11, Vol.33 (11), p.1539-1549 |
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Main Authors: | , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The galvanostatic anodization of commercially pure titanium is studied with current densities lower than 500 A m
−2 in 1 M sulphuric acid between 25 and 75°C. Two types of electrochemical behaviour are observed: the first type is characterized by a maximum value of the cell voltage and the second one by a continuous increase of the anode to cathode (which is platinum) potential difference. These different behaviours may be related to different structures of the anodic films (as observed by SEM and TEM) and to the compositions of these films (as determined by Auger analysis, RHEED and HEED). |
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ISSN: | 0013-4686 1873-3859 |
DOI: | 10.1016/0013-4686(88)80223-8 |