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High-purity epitaxial indium phosphide grown by the hydride technique
Indium phosphide layers with electron mobilities at liquid-nitrogen temperature of 91 000–125 000 cm2 /V s and carrier concentrations of 3–6×1014 cm−3 have been routinely grown by hydride vapor phase epitaxy. This 77 K mobility is significantly higher than the best previously reported for hydride va...
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Published in: | Applied physics letters 1988-11, Vol.53 (19), p.1868-1870 |
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container_end_page | 1870 |
container_issue | 19 |
container_start_page | 1868 |
container_title | Applied physics letters |
container_volume | 53 |
creator | MCCOLLUM, M. J KIM, M. H BOSE, S. S LEE, B STILLMAN, G. E |
description | Indium phosphide layers with electron mobilities at liquid-nitrogen temperature of 91 000–125 000 cm2 /V s and carrier concentrations of 3–6×1014 cm−3 have been routinely grown by hydride vapor phase epitaxy. This 77 K mobility is significantly higher than the best previously reported for hydride vapor phase epitaxial InP. Analysis by variable temperature Hall effect, photothermal ionization spectroscopy, photoluminescence, and magnetophotoluminescence confirms the high purity of the samples. The influence of O2 on Si incorporation (injected over the In source) has also been studied. The injected oxygen did not significantly influence the silicon donor concentration. |
doi_str_mv | 10.1063/1.100483 |
format | article |
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J ; KIM, M. H ; BOSE, S. S ; LEE, B ; STILLMAN, G. E</creator><creatorcontrib>MCCOLLUM, M. J ; KIM, M. H ; BOSE, S. S ; LEE, B ; STILLMAN, G. E</creatorcontrib><description>Indium phosphide layers with electron mobilities at liquid-nitrogen temperature of 91 000–125 000 cm2 /V s and carrier concentrations of 3–6×1014 cm−3 have been routinely grown by hydride vapor phase epitaxy. This 77 K mobility is significantly higher than the best previously reported for hydride vapor phase epitaxial InP. Analysis by variable temperature Hall effect, photothermal ionization spectroscopy, photoluminescence, and magnetophotoluminescence confirms the high purity of the samples. The influence of O2 on Si incorporation (injected over the In source) has also been studied. 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E</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c285t-361f989ed5d8fb0466c61854086bab43dae4fc2fc5d2bd7059c71cead29333d53</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1988</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Conductivity phenomena in semiconductors and insulators</topic><topic>Electronic transport in condensed matter</topic><topic>Exact sciences and technology</topic><topic>Low-field transport and mobility; piezoresistance</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>MCCOLLUM, M. J</creatorcontrib><creatorcontrib>KIM, M. H</creatorcontrib><creatorcontrib>BOSE, S. S</creatorcontrib><creatorcontrib>LEE, B</creatorcontrib><creatorcontrib>STILLMAN, G. 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E</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High-purity epitaxial indium phosphide grown by the hydride technique</atitle><jtitle>Applied physics letters</jtitle><date>1988-11-07</date><risdate>1988</risdate><volume>53</volume><issue>19</issue><spage>1868</spage><epage>1870</epage><pages>1868-1870</pages><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Indium phosphide layers with electron mobilities at liquid-nitrogen temperature of 91 000–125 000 cm2 /V s and carrier concentrations of 3–6×1014 cm−3 have been routinely grown by hydride vapor phase epitaxy. This 77 K mobility is significantly higher than the best previously reported for hydride vapor phase epitaxial InP. Analysis by variable temperature Hall effect, photothermal ionization spectroscopy, photoluminescence, and magnetophotoluminescence confirms the high purity of the samples. 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source | AIP_美国物理联合会期刊回溯(NSTL购买) |
subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Conductivity phenomena in semiconductors and insulators Electronic transport in condensed matter Exact sciences and technology Low-field transport and mobility piezoresistance Physics |
title | High-purity epitaxial indium phosphide grown by the hydride technique |
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