Electron energy deposition in atomic oxygen

A discrete, time-dependent energy deposition model is developed and applied to the study of high-energy electron-beam (100 eV–10 MeV) deposition in atomic oxygen. Secondary electron distributions are computed and observed to relax to steady-state results. Characteristic relaxation times are shown. T...

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Bibliographic Details
Published in:Journal of applied physics 1988, Vol.63 (1), p.1-10
Main Authors: SLINKER, S. P, TAYLOR, R. D, ALI, A. W
Format: Article
Language:English
Subjects:
Atomic and molecular collision processes and interactions
Atomic and molecular physics
Electron scattering
Exact sciences and technology
Physics
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Summary:A discrete, time-dependent energy deposition model is developed and applied to the study of high-energy electron-beam (100 eV–10 MeV) deposition in atomic oxygen. Secondary electron distributions are computed and observed to relax to steady-state results. Characteristic relaxation times are shown. The loss function, mean energies per electron-ion pair production, production efficiencies, and distribution functions are presented for a wide range of energies. The model uses the latest experimental and theoretical cross sections as input.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.340491