Role of heat transfer and fluid flow in the chemical vapor deposition of diamond

The role of fluid flow and heat transfer in determining the quality of the diamond films and the rate of their deposition in a hot-filament chemical vapor deposition (HFCVD) reactor was investigated both experimentally and theoretically. The equations of conservation of mass, momentum, and enthalpy...

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Bibliographic Details
Published in:Journal of applied physics 1990-09, Vol.68 (5), p.2424-2432
Main Authors: DEBROY, T, TANKALA, K, YARBROUGH, W. A, MESSIER, R
Format: Article
Language:English
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings
film growth and epitaxy
Physics
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Summary:The role of fluid flow and heat transfer in determining the quality of the diamond films and the rate of their deposition in a hot-filament chemical vapor deposition (HFCVD) reactor was investigated both experimentally and theoretically. The equations of conservation of mass, momentum, and enthalpy were solved numerically to calculate the temperature and fluid flow fields. Experiments were conducted with various flow configurations, and the deposition rates and the spatial variations of film thickness were examined in each case. The films were characterized by Raman spectroscopy, x-ray, and scanning electron microscopy. The influences of free and forced convection, and diffusion due to concentration and temperature gradients (Soret effect) were examined. Comparison of the computed results with the experimental data revealed the importance of thermal diffusion in the HFCVD of diamond.
ISSN:0021-8979
1089-7550
DOI:10.1063/1.346502