Outdiffusion of Be during rapid thermal annealing of high-dose Be-implanted GaAs

• Published in: Journal of applied physics 1990-05, Vol.67 (10), p.6589-6591
• Main Authors: BARATTE, H, SADANA, D. K, DE SOUZA, J. P, HALLALI, P. E, SCHAD, R. G, NORCOTT, M, CARDONE, F
• Format: Article
• Language: English
• Subjects: Condensed matter: structure, mechanical and thermal properties; Diffusion in solids; Diffusion of impurities; Exact sciences and technology; Physics; Transport properties of condensed matter (nonelectronic)
• ISSN: 0021-8979; 1089-7550
• DOI: 10.1063/1.345093

The outdiffusion of Be implanted into GaAs has been found to be identical after capless or capped (Si3N4 or SiO2 ) rapid thermal annealing (RTA) at 900–1000 °C and to depend on the Be dose and its proximity to the surface. The outdiffusion is more pronounced when the Be implant is shallow (1×1015 cm−2 ). It is demonstrated that the Be outdiffusion is driven by the presence of a highly damaged surface layer. Auger results suggest the formation of a BeOx compound at the surface of a high-dose (1×1016 cm−2 ) Be-implanted sample that underwent capless RTA at 1000 °C/1 s. It appears that BeOx formation occurs when the outdiffused Be interacts with the native Ga/As oxides during annealing. All the Be remaining in the GaAs after a >900 °C/2 s RTA is electrically active.