The investigation on the microstructure of magnetron sputtering ion plated Al/Cu film: The effect of substrate negative bias voltage

The effect of substrate negative bias voltage (SNBV) on the microstructure of magnetron sputtered thin films was investigated for Al films on Cu substrates. It was found that the higher the SNBV, the richer the Cu content of the phases formed. The phase formed included: Cu, Al, Al sub 2 Cu, AlCu, Al...

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Bibliographic Details
Published in:Scripta metallurgica 1988, Vol.22 (6), p.757-760
Main Authors: Chen, B.Q., Wang, F.J., Wang, Y.K., Wang, J.X., Han, H.M., Wang, C.N., Niu, T.Y., Gao, H.W.
Format: Article
Language:English
Subjects:
Applied sciences
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
Materials science
Metallic coatings
Metals, semimetals and alloys
Metals. Metallurgy
Physics
Production techniques
Specific materials
Surface treatment
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Summary:The effect of substrate negative bias voltage (SNBV) on the microstructure of magnetron sputtered thin films was investigated for Al films on Cu substrates. It was found that the higher the SNBV, the richer the Cu content of the phases formed. The phase formed included: Cu, Al, Al sub 2 Cu, AlCu, Al sub 4 Cu sub 9 and AlCu sub 3 . There were specific orientation relationships between the phases formed in the thin films. 4 ref.--D.O.N.
ISSN:0036-9748
DOI:10.1016/S0036-9748(88)80044-9