The adsorption process of hydrogen on titanium films, a CPD and QCM study

We combined a contact potential difference (CPD) method and a quartz crystal microbalance (QCM) method to estimate quantiatively the sorption process of hydrogen atoms in titanium films. At the adsorption of less than about 1.2×10 17 atoms/cm 2 , the exsistence of both r-type and s-type adsorption s...

Full description

Saved in:
Bibliographic Details
Published in:Japanese Journal of Applied Physics 1988-08, Vol.27 (8), p.1540-1541
Main Authors: KONISHI, R, KOBAYASHI, Y, SASAKURA, H
Format: Article
Language:English
Subjects:
Applied sciences
Chemistry
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
General and physical chemistry
Materials science
Metals, semimetals and alloys
Metals. Metallurgy
Physics
Solid-gas interface
Specific materials
Surface physical chemistry
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We combined a contact potential difference (CPD) method and a quartz crystal microbalance (QCM) method to estimate quantiatively the sorption process of hydrogen atoms in titanium films. At the adsorption of less than about 1.2×10 17 atoms/cm 2 , the exsistence of both r-type and s-type adsorption states was confirmed. At further adsorption, the changes of CPD and QCM suggest the formation of a stable hydride and the existence of s-type adsorption stable on hydride.
ISSN:0021-4922
1347-4065
DOI:10.1143/jjap.27.1540