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The adsorption process of hydrogen on titanium films, a CPD and QCM study

We combined a contact potential difference (CPD) method and a quartz crystal microbalance (QCM) method to estimate quantiatively the sorption process of hydrogen atoms in titanium films. At the adsorption of less than about 1.2×10 17 atoms/cm 2 , the exsistence of both r-type and s-type adsorption s...

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Published in:Japanese Journal of Applied Physics 1988-08, Vol.27 (8), p.1540-1541
Main Authors: KONISHI, R, KOBAYASHI, Y, SASAKURA, H
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Language:English
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cited_by cdi_FETCH-LOGICAL-c388t-a6a81e85ee87adbe58071ae0bca6252d3ac2931e24fe01c9575c0d315bd0b1fd3
cites cdi_FETCH-LOGICAL-c388t-a6a81e85ee87adbe58071ae0bca6252d3ac2931e24fe01c9575c0d315bd0b1fd3
container_end_page 1541
container_issue 8
container_start_page 1540
container_title Japanese Journal of Applied Physics
container_volume 27
creator KONISHI, R
KOBAYASHI, Y
SASAKURA, H
description We combined a contact potential difference (CPD) method and a quartz crystal microbalance (QCM) method to estimate quantiatively the sorption process of hydrogen atoms in titanium films. At the adsorption of less than about 1.2×10 17 atoms/cm 2 , the exsistence of both r-type and s-type adsorption states was confirmed. At further adsorption, the changes of CPD and QCM suggest the formation of a stable hydride and the existence of s-type adsorption stable on hydride.
doi_str_mv 10.1143/jjap.27.1540
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_25073713</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>25073713</sourcerecordid><originalsourceid>FETCH-LOGICAL-c388t-a6a81e85ee87adbe58071ae0bca6252d3ac2931e24fe01c9575c0d315bd0b1fd3</originalsourceid><addsrcrecordid>eNo9kEtPwzAQhC0EEqVw4wf4gDg1xWvHcXKswqtVEUUq52hjOzRVXtjJof-eVK04rWb1zWg0hNwDmwOE4mm_x27O1RxkyC7IBESogpBF8pJMGOMQhAnn1-TG-_0oIxnChCy3O0vR-NZ1fdk2tHOttt7TtqC7g3Htj23o-O7LHptyqGlRVrWfUaTp5pliY-hX-kF9P5jDLbkqsPL27nyn5Pv1ZZu-B-vPt2W6WAdaxHEfYIQx2FhaGys0uZUxU4CW5RojLrkRqHkiwPKwsAx0IpXUzAiQuWE5FEZMyeMpd6z6O1jfZ3Xpta0qbGw7-IxLpoQCMYKzE6hd672zRda5skZ3yIBlx72y1WqxybjKjnuN-MM5F73GqnDY6NL_eyIFPEmE-AN4JmoP</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>25073713</pqid></control><display><type>article</type><title>The adsorption process of hydrogen on titanium films, a CPD and QCM study</title><source>Institute of Physics</source><source>IOPscience extra</source><creator>KONISHI, R ; KOBAYASHI, Y ; SASAKURA, H</creator><creatorcontrib>KONISHI, R ; KOBAYASHI, Y ; SASAKURA, H</creatorcontrib><description>We combined a contact potential difference (CPD) method and a quartz crystal microbalance (QCM) method to estimate quantiatively the sorption process of hydrogen atoms in titanium films. At the adsorption of less than about 1.2×10 17 atoms/cm 2 , the exsistence of both r-type and s-type adsorption states was confirmed. At further adsorption, the changes of CPD and QCM suggest the formation of a stable hydride and the existence of s-type adsorption stable on hydride.</description><identifier>ISSN: 0021-4922</identifier><identifier>EISSN: 1347-4065</identifier><identifier>DOI: 10.1143/jjap.27.1540</identifier><identifier>CODEN: JJAPA5</identifier><language>eng</language><publisher>Tokyo: Japanese journal of applied physics</publisher><subject>Applied sciences ; Chemistry ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; General and physical chemistry ; Materials science ; Metals, semimetals and alloys ; Metals. Metallurgy ; Physics ; Solid-gas interface ; Specific materials ; Surface physical chemistry</subject><ispartof>Japanese Journal of Applied Physics, 1988-08, Vol.27 (8), p.1540-1541</ispartof><rights>1990 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c388t-a6a81e85ee87adbe58071ae0bca6252d3ac2931e24fe01c9575c0d315bd0b1fd3</citedby><cites>FETCH-LOGICAL-c388t-a6a81e85ee87adbe58071ae0bca6252d3ac2931e24fe01c9575c0d315bd0b1fd3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=6712993$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>KONISHI, R</creatorcontrib><creatorcontrib>KOBAYASHI, Y</creatorcontrib><creatorcontrib>SASAKURA, H</creatorcontrib><title>The adsorption process of hydrogen on titanium films, a CPD and QCM study</title><title>Japanese Journal of Applied Physics</title><description>We combined a contact potential difference (CPD) method and a quartz crystal microbalance (QCM) method to estimate quantiatively the sorption process of hydrogen atoms in titanium films. At the adsorption of less than about 1.2×10 17 atoms/cm 2 , the exsistence of both r-type and s-type adsorption states was confirmed. At further adsorption, the changes of CPD and QCM suggest the formation of a stable hydride and the existence of s-type adsorption stable on hydride.</description><subject>Applied sciences</subject><subject>Chemistry</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>General and physical chemistry</subject><subject>Materials science</subject><subject>Metals, semimetals and alloys</subject><subject>Metals. Metallurgy</subject><subject>Physics</subject><subject>Solid-gas interface</subject><subject>Specific materials</subject><subject>Surface physical chemistry</subject><issn>0021-4922</issn><issn>1347-4065</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1988</creationdate><recordtype>article</recordtype><recordid>eNo9kEtPwzAQhC0EEqVw4wf4gDg1xWvHcXKswqtVEUUq52hjOzRVXtjJof-eVK04rWb1zWg0hNwDmwOE4mm_x27O1RxkyC7IBESogpBF8pJMGOMQhAnn1-TG-_0oIxnChCy3O0vR-NZ1fdk2tHOttt7TtqC7g3Htj23o-O7LHptyqGlRVrWfUaTp5pliY-hX-kF9P5jDLbkqsPL27nyn5Pv1ZZu-B-vPt2W6WAdaxHEfYIQx2FhaGys0uZUxU4CW5RojLrkRqHkiwPKwsAx0IpXUzAiQuWE5FEZMyeMpd6z6O1jfZ3Xpta0qbGw7-IxLpoQCMYKzE6hd672zRda5skZ3yIBlx72y1WqxybjKjnuN-MM5F73GqnDY6NL_eyIFPEmE-AN4JmoP</recordid><startdate>19880801</startdate><enddate>19880801</enddate><creator>KONISHI, R</creator><creator>KOBAYASHI, Y</creator><creator>SASAKURA, H</creator><general>Japanese journal of applied physics</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19880801</creationdate><title>The adsorption process of hydrogen on titanium films, a CPD and QCM study</title><author>KONISHI, R ; KOBAYASHI, Y ; SASAKURA, H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c388t-a6a81e85ee87adbe58071ae0bca6252d3ac2931e24fe01c9575c0d315bd0b1fd3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1988</creationdate><topic>Applied sciences</topic><topic>Chemistry</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>General and physical chemistry</topic><topic>Materials science</topic><topic>Metals, semimetals and alloys</topic><topic>Metals. Metallurgy</topic><topic>Physics</topic><topic>Solid-gas interface</topic><topic>Specific materials</topic><topic>Surface physical chemistry</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>KONISHI, R</creatorcontrib><creatorcontrib>KOBAYASHI, Y</creatorcontrib><creatorcontrib>SASAKURA, H</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Japanese Journal of Applied Physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>KONISHI, R</au><au>KOBAYASHI, Y</au><au>SASAKURA, H</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The adsorption process of hydrogen on titanium films, a CPD and QCM study</atitle><jtitle>Japanese Journal of Applied Physics</jtitle><date>1988-08-01</date><risdate>1988</risdate><volume>27</volume><issue>8</issue><spage>1540</spage><epage>1541</epage><pages>1540-1541</pages><issn>0021-4922</issn><eissn>1347-4065</eissn><coden>JJAPA5</coden><abstract>We combined a contact potential difference (CPD) method and a quartz crystal microbalance (QCM) method to estimate quantiatively the sorption process of hydrogen atoms in titanium films. At the adsorption of less than about 1.2×10 17 atoms/cm 2 , the exsistence of both r-type and s-type adsorption states was confirmed. At further adsorption, the changes of CPD and QCM suggest the formation of a stable hydride and the existence of s-type adsorption stable on hydride.</abstract><cop>Tokyo</cop><pub>Japanese journal of applied physics</pub><doi>10.1143/jjap.27.1540</doi><tpages>2</tpages></addata></record>
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1347-4065
language eng
recordid cdi_proquest_miscellaneous_25073713
source Institute of Physics; IOPscience extra
subjects Applied sciences
Chemistry
Cross-disciplinary physics: materials science
rheology
Exact sciences and technology
General and physical chemistry
Materials science
Metals, semimetals and alloys
Metals. Metallurgy
Physics
Solid-gas interface
Specific materials
Surface physical chemistry
title The adsorption process of hydrogen on titanium films, a CPD and QCM study
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T18%3A18%3A57IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=The%20adsorption%20process%20of%20hydrogen%20on%20titanium%20films,%20a%20CPD%20and%20QCM%20study&rft.jtitle=Japanese%20Journal%20of%20Applied%20Physics&rft.au=KONISHI,%20R&rft.date=1988-08-01&rft.volume=27&rft.issue=8&rft.spage=1540&rft.epage=1541&rft.pages=1540-1541&rft.issn=0021-4922&rft.eissn=1347-4065&rft.coden=JJAPA5&rft_id=info:doi/10.1143/jjap.27.1540&rft_dat=%3Cproquest_cross%3E25073713%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c388t-a6a81e85ee87adbe58071ae0bca6252d3ac2931e24fe01c9575c0d315bd0b1fd3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=25073713&rft_id=info:pmid/&rfr_iscdi=true