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Thermally stable contacts to n-type GaAs. VIII. Sputter-deposited InAs contacts
The electrical properties and microstructure of InAs ohmic contacts to n-type GaAs, prepared by sputter-depositing a single target, were studied by measuring the contact resistance (R sub(c)) by the transmission line method and analyzing the interfacial structure by x-ray diffraction and cross-secti...
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Published in: | Journal of applied physics 1990-01, Vol.68 (5), p.2475-2481 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Online Access: | Get full text |
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Summary: | The electrical properties and microstructure of InAs ohmic contacts to n-type GaAs, prepared by sputter-depositing a single target, were studied by measuring the contact resistance (R sub(c)) by the transmission line method and analyzing the interfacial structure by x-ray diffraction and cross-sectional transmission electron microscopy. Current-voltage measurement of an as-deposited InAs/W contact showed Schottky behavior. |
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ISSN: | 0021-8979 |