Tribological Behavior of Titanium Nitride Films Deposited by High Energy Ion-Beam-Assisted Deposition

• Published in: Surface & coatings technology 1988-04, Vol.36 (3-4), p.781-790
• Main Authors: Bolster, R N, Singer, I L, Kant, R A, Sartwell, B D, Gossett, C R
• Format: Article
• Language: English
• ISSN: 0257-8972

Hardness measurements and abrasive and sliding wear tests were performed on titanium nitride films deposited onto metal (Ni, M2, and 52100 steel) and ceramic (Al sub 2 O sub 3 and SiC) substrates by reactive magnetron sputtering and by ion-beam-assisted deposition (IBAD) using 30 keV N exp + sub 2 or 40 keV Ti exp + ions. Composition--depth profiles obtained by Rutherford backscattering indicated significant intermixing of film and substrate at the interface. IBAD titanium nitride films were found to be considerably softer and approx 1/30 as abrasion resistant as reactively sputtered titanium nitride films. The IBAD films were extremely adherent to either steel or ceramic substrates and reduced the dry sliding friction coefficient for steel--steel and ceramic--ceramic couples from roughly 0.7 to 0.2. The intermixing of film and substrate atoms can account for the excellent adherence of the IBAD films to otherwise incompatible ceramic substrates such as SiC. Based on these and previous studies, the tribomechanical properties of high energy IBAD titanium nitride films appear to be relatively insensitive to processing parameters such as ion species, ion-to-atom arrival ratio and high vacuum conditions--an advantage in commercial film preparation. 20 ref.--AA