Characterization of Mo/B sub 4 C multilayers

Multilayer is selected for max, normal incidence reflection of 6.7-nm X-rays. Microstructural details of 3.4-nm samples, prepared in cross section, are revealed using TEM. Interface roughness (above 0.6 nm) and layer undulations (1 nm) are found. Limitation in growth morphology is due to an interfac...

Full description

Saved in:
Bibliographic Details
Published in:Thin solid films 1991-01, Vol.206 (1-2), p.365-368
Main Authors: Jankowski, A F, Perry, P L
Format: Article
Language:English
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Multilayer is selected for max, normal incidence reflection of 6.7-nm X-rays. Microstructural details of 3.4-nm samples, prepared in cross section, are revealed using TEM. Interface roughness (above 0.6 nm) and layer undulations (1 nm) are found. Limitation in growth morphology is due to an interfacial reactivity originating in the surface energy of interface formation and the relative instability of the multilayer system.
ISSN:0040-6090