Formation of As-Grown YBaCuO Thin Films by RF Magnetron Sputtering from Three Targets

As-grown YBaCuO thin films with 500 Å thickness have been formed at 620°C on MgO(100) substrates by RF magnetron sputtering from three targets: Y 1.5 Ba 2 Cu 3 O x , Y 1 Ba 3 Cu 3 O x and Y 1 Ba 2 Cu 4.5 O x . The chemical composition can be precisely controlled by this method. A smooth surface was...

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Bibliographic Details
Published in:Japanese Journal of Applied Physics 1989-10, Vol.28 (10R), p.1797-1801
Main Authors: Kuroda, Ken'ichi, Kojima, Kazuyoshi, Tanioku, Masami, Yokoyama, Kazuo, Hamanaka, Koichi
Format: Article
Language:English
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Summary:As-grown YBaCuO thin films with 500 Å thickness have been formed at 620°C on MgO(100) substrates by RF magnetron sputtering from three targets: Y 1.5 Ba 2 Cu 3 O x , Y 1 Ba 3 Cu 3 O x and Y 1 Ba 2 Cu 4.5 O x . The chemical composition can be precisely controlled by this method. A smooth surface was obtained by adjusting the chemical composition. Zero resistivity was observed at 81 K for the best superconducting film. The films with a slightly Cu excessive composition showed somewhat higher T c (zero) than the stoichiometric film. X-ray diffraction spectra of sputtered films did not change distinguishably upon varying of the chemical composition when the value of Ba/Y ranged from 1.5 to 2.3 and the value of Cu/Y ranged from 1.8 to 3.3. The c -axis of the film was highly oriented normal to the substrate surface, and the c -axis lattice constant was equal to that of a bulk sample.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.28.1797