Light scattering properties of x-ray lithography mask substrates

Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model simulating the contrast in a bright field mask/wafer...

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Bibliographic Details
Published in:Microelectronic engineering 1991-01, Vol.13 (1-4), p.347-350
Main Authors: Maldonado, J.R., Vladimirsky, Y., Vladimirsky, O., Babich, I., Fuentes, R., Guarnieri, D., Whitehair, S.W., Cuomo, J.
Format: Article
Language:English
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Summary:Experimental results are presented on the light scattering properties of x-ray mask substrates relevant to x-ray lithography systems utilizing optical alignment between mask and wafer. The results are compared with a simple light scattering model simulating the contrast in a bright field mask/wafer alignment system.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(91)90109-Q