Improvements in aluminum adhesion and breakdown voltages of polyvinylidene fluoride films following exposure to gas plasmas

Changes in water wettability, improvement in adhesion of vapor deposited aluminum and increases in dielectric breakdown voltage in thin, 12 micron PVDF films were observed following brief exposure of these films to low‐temperature gas plasmas.

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Bibliographic Details
Published in:Polymers for advanced technologies 1991-08, Vol.2 (4), p.209-210
Main Authors: Mammone, Robert J., Wade Jr, William L., Binder, Michael
Format: Article
Language:English
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Description
Summary:Changes in water wettability, improvement in adhesion of vapor deposited aluminum and increases in dielectric breakdown voltage in thin, 12 micron PVDF films were observed following brief exposure of these films to low‐temperature gas plasmas.
ISSN:1042-7147
1099-1581
DOI:10.1002/pat.1991.220020407