Multi electron beam lithography: Fabrication of a control unit

Electron beam lithography is limited by the extremely low throughput of currently working machines. This paper describes a multiple beam forming unit for a new line printer type lithography system called High Speed, High Resolution Electron Lithography System (HISEL). The simultaneous use of a multi...

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Bibliographic Details
Published in:Microelectronic engineering 1989, Vol.9 (1), p.205-208
Main Authors: Schnakenberg, U., Benecke, W., Wallendszus, V., Müller, K.P., Heuberger, A., Lischke, B.
Format: Article
Language:English
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Summary:Electron beam lithography is limited by the extremely low throughput of currently working machines. This paper describes a multiple beam forming unit for a new line printer type lithography system called High Speed, High Resolution Electron Lithography System (HISEL). The simultaneous use of a multiple number of individually controllable electron beams allows an essential reduction of the pattern transfer time. In a first version, a total number of 1024 electron beams is used. The control unit consists of two independent elements: the aperture plate (illuminated by an electron line type source) which forms a line of 1024 square-shaped (10 × 10) μm 2 electron beams and the deflection plate with a corresponding set of 1024 microcapacitors. The capacitors allow an individual beam deflection, e.g. on-off switching of the beams. The fabrication is based on silicon micromechanics and X-ray lithography.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(89)90048-8