An e-beam comb-probe printer for nanolithography

We propose a printer-type e-beam system to replace writing pattern generators for obtaining throughput improvements in nanolithography. The e-beam comb-probe printer with 1024 probes should be capable of combining 25 nm resolution with a total beam current of 5 μA corresponding to an exposure speed...

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Bibliographic Details
Published in:Microelectronic engineering 1989, Vol.9 (1), p.199-203
Main Authors: Lischke, B., Christaller, G., Herrmann, K.H., Heuberger, A., Knapek, E., Kniepkamp, H., Rose, H., Rüttenauer, W., Siegel, G.
Format: Article
Language:English
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Summary:We propose a printer-type e-beam system to replace writing pattern generators for obtaining throughput improvements in nanolithography. The e-beam comb-probe printer with 1024 probes should be capable of combining 25 nm resolution with a total beam current of 5 μA corresponding to an exposure speed of 0.1 cm 2/s, which is several orders of magnitude superior to today's latest equipment.
ISSN:0167-9317
1873-5568
DOI:10.1016/0167-9317(89)90047-6