Interdiffusion and amorphization in Ni/Ti multilayers

Diffusion was studied in (fcc) Ni / (hcp) Ti multilayers in the temperature range 453 – 513 K by using low angle X-ray scattering (LAXS). Diffusion coefficients ranging from 0.6 10 −24 to 7 10 −24 m 2s −1 were obtained for multilayers with a composition modulation wavelength of 35, 80 and 110 Å. The...

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Bibliographic Details
Published in:Solid state communications 1991-08, Vol.79 (5), p.389-393
Main Authors: Bouhki, M., Bruson, A., Guilmin, P.
Format: Article
Language:English
Subjects:
Applied sciences
Chemical interdiffusion
diffusion barriers
Condensed matter: structure, mechanical and thermal properties
Diffusion in solids
Exact sciences and technology
Metals. Metallurgy
Physics
Transport properties of condensed matter (nonelectronic)
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Summary:Diffusion was studied in (fcc) Ni / (hcp) Ti multilayers in the temperature range 453 – 513 K by using low angle X-ray scattering (LAXS). Diffusion coefficients ranging from 0.6 10 −24 to 7 10 −24 m 2s −1 were obtained for multilayers with a composition modulation wavelength of 35, 80 and 110 Å. These measurements suggest diffusion induced solid state amorphization reaction (SSAR) with a low activation energy. It was observed that amorphization does not follow entirely the layer growth model.
ISSN:0038-1098
1879-2766
DOI:10.1016/0038-1098(91)90490-M