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Patterning and characterization of large-area quantum wire arrays
Large-area arrays of parallel quantum wires of 30–80 nm width are achieved using a combination of x-ray lithography, wet chemical etching, and low-pressure metalorganic vapor phase epitaxy. The quantum wires are characterized using low-temperature photoluminescence and magnetotransport measurements....
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Published in: | Applied physics letters 1991-04, Vol.58 (14), p.1539-1541 |
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Main Authors: | , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Large-area arrays of parallel quantum wires of 30–80 nm width are achieved using a combination of x-ray lithography, wet chemical etching, and low-pressure metalorganic vapor phase epitaxy. The quantum wires are characterized using low-temperature photoluminescence and magnetotransport measurements. The quantum confinement is reflected in a clear blue shift in the luminescence peak, and in deviation from the periodicity of the Shubnikov–de Haas oscillations as a function of inverse magnetic field. |
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ISSN: | 0003-6951 1077-3118 |
DOI: | 10.1063/1.105171 |