Loading…
Studies of the DC, low-frequency, and microwave characteristics of uniform and step-doped GaAs/AlGaAs HEMTs
A theoretical and experimental study of step-doped HEMTs (high electron mobility transition) with lightly and heavily doped regions is presented. Threshold voltage control and sensitivity with respect to growth parameters and recessing etching, as well as design criteria, are investigated for these...
Saved in:
Published in: | IEEE transactions on electron devices 1989-10, Vol.36 (10), p.2288-2298 |
---|---|
Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c463t-e19070697ab9c851544060cc2b4ffadd1efd0d09bae625fd0e9bc931b048941a3 |
---|---|
cites | cdi_FETCH-LOGICAL-c463t-e19070697ab9c851544060cc2b4ffadd1efd0d09bae625fd0e9bc931b048941a3 |
container_end_page | 2298 |
container_issue | 10 |
container_start_page | 2288 |
container_title | IEEE transactions on electron devices |
container_volume | 36 |
creator | Chau, H.-F. Pavlidis, D. Cazaux, J.-L. Graffeuil, J. |
description | A theoretical and experimental study of step-doped HEMTs (high electron mobility transition) with lightly and heavily doped regions is presented. Threshold voltage control and sensitivity with respect to growth parameters and recessing etching, as well as design criteria, are investigated for these structures. A three-regime charge control model is used to predict their performance. Using the same semianalytical theory, which was validated with the help of a self-consistent analysis, both conventional and step-doped HEMTs with an i-layer are compared. 1- mu m gate-length n-channel HEMTs with step-doped profile thicknesses of 25, 50, and 100 AA were fabricated and tested at low and high frequencies. The low-frequency noise can be controlled by the step thickness, and a noise analysis is presented. Cutoff frequencies of 16 to 18 GHz and maximum oscillation frequencies of 41 to 59 GHz were measured and correlated to the step thickness.< > |
doi_str_mv | 10.1109/16.40913 |
format | article |
fullrecord | <record><control><sourceid>proquest_ieee_</sourceid><recordid>TN_cdi_proquest_miscellaneous_25464756</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><ieee_id>40913</ieee_id><sourcerecordid>25464756</sourcerecordid><originalsourceid>FETCH-LOGICAL-c463t-e19070697ab9c851544060cc2b4ffadd1efd0d09bae625fd0e9bc931b048941a3</originalsourceid><addsrcrecordid>eNqN0T1PwzAQBmALgUQpSKxsXkAMTWsnjpMbq1JapCIGyhw5zlk1pEmxU6r-e9IPwQjT2fLjV7o7Qq4563POYMBlXzDg0Qnp8DhOApBCnpIOYzwNIEqjc3Lh_Xt7lUKEHfLx2qwLi57WhjYLpA-jHi3rTWAcfq6x0tseVVVBl1a7eqO-kOqFcko36KxvrN7_W1fW1G65h77BVVDUKyzoRA39YFjuCp2On-f-kpwZVXq8OtYueXscz0fTYPYyeRoNZ4EWMmoC5MASJiFROeg05rEQTDKtw1wYo4qCoylYwSBXKMO4PSPkGiKeM5GC4CrqkrtD7srVbRO-yZbWayxLVWG99lkITEQJwN8wTSWEsfwHjNvZAvsbxkKKZJ94f4DtXL13aLKVs0vlthln2W6RGZfZfpEtvT1mKq9VaZyqtPW_HpJk10zrbg7OIuLP8yHjG4mro7M</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>25464756</pqid></control><display><type>article</type><title>Studies of the DC, low-frequency, and microwave characteristics of uniform and step-doped GaAs/AlGaAs HEMTs</title><source>IEEE Xplore (Online service)</source><creator>Chau, H.-F. ; Pavlidis, D. ; Cazaux, J.-L. ; Graffeuil, J.</creator><creatorcontrib>Chau, H.-F. ; Pavlidis, D. ; Cazaux, J.-L. ; Graffeuil, J.</creatorcontrib><description>A theoretical and experimental study of step-doped HEMTs (high electron mobility transition) with lightly and heavily doped regions is presented. Threshold voltage control and sensitivity with respect to growth parameters and recessing etching, as well as design criteria, are investigated for these structures. A three-regime charge control model is used to predict their performance. Using the same semianalytical theory, which was validated with the help of a self-consistent analysis, both conventional and step-doped HEMTs with an i-layer are compared. 1- mu m gate-length n-channel HEMTs with step-doped profile thicknesses of 25, 50, and 100 AA were fabricated and tested at low and high frequencies. The low-frequency noise can be controlled by the step thickness, and a noise analysis is presented. Cutoff frequencies of 16 to 18 GHz and maximum oscillation frequencies of 41 to 59 GHz were measured and correlated to the step thickness.< ></description><identifier>ISSN: 0018-9383</identifier><identifier>EISSN: 1557-9646</identifier><identifier>DOI: 10.1109/16.40913</identifier><identifier>CODEN: IETDAI</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Automatic testing ; Cutoff frequency ; Electron mobility ; Electronics ; Etching ; Exact sciences and technology ; HEMTs ; Low-frequency noise ; MODFETs ; Predictive models ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Threshold voltage ; Transistors ; Voltage control</subject><ispartof>IEEE transactions on electron devices, 1989-10, Vol.36 (10), p.2288-2298</ispartof><rights>1991 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c463t-e19070697ab9c851544060cc2b4ffadd1efd0d09bae625fd0e9bc931b048941a3</citedby><cites>FETCH-LOGICAL-c463t-e19070697ab9c851544060cc2b4ffadd1efd0d09bae625fd0e9bc931b048941a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/40913$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,27903,27904,54775</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=19777993$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Chau, H.-F.</creatorcontrib><creatorcontrib>Pavlidis, D.</creatorcontrib><creatorcontrib>Cazaux, J.-L.</creatorcontrib><creatorcontrib>Graffeuil, J.</creatorcontrib><title>Studies of the DC, low-frequency, and microwave characteristics of uniform and step-doped GaAs/AlGaAs HEMTs</title><title>IEEE transactions on electron devices</title><addtitle>TED</addtitle><description>A theoretical and experimental study of step-doped HEMTs (high electron mobility transition) with lightly and heavily doped regions is presented. Threshold voltage control and sensitivity with respect to growth parameters and recessing etching, as well as design criteria, are investigated for these structures. A three-regime charge control model is used to predict their performance. Using the same semianalytical theory, which was validated with the help of a self-consistent analysis, both conventional and step-doped HEMTs with an i-layer are compared. 1- mu m gate-length n-channel HEMTs with step-doped profile thicknesses of 25, 50, and 100 AA were fabricated and tested at low and high frequencies. The low-frequency noise can be controlled by the step thickness, and a noise analysis is presented. Cutoff frequencies of 16 to 18 GHz and maximum oscillation frequencies of 41 to 59 GHz were measured and correlated to the step thickness.< ></description><subject>Applied sciences</subject><subject>Automatic testing</subject><subject>Cutoff frequency</subject><subject>Electron mobility</subject><subject>Electronics</subject><subject>Etching</subject><subject>Exact sciences and technology</subject><subject>HEMTs</subject><subject>Low-frequency noise</subject><subject>MODFETs</subject><subject>Predictive models</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Threshold voltage</subject><subject>Transistors</subject><subject>Voltage control</subject><issn>0018-9383</issn><issn>1557-9646</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1989</creationdate><recordtype>article</recordtype><recordid>eNqN0T1PwzAQBmALgUQpSKxsXkAMTWsnjpMbq1JapCIGyhw5zlk1pEmxU6r-e9IPwQjT2fLjV7o7Qq4563POYMBlXzDg0Qnp8DhOApBCnpIOYzwNIEqjc3Lh_Xt7lUKEHfLx2qwLi57WhjYLpA-jHi3rTWAcfq6x0tseVVVBl1a7eqO-kOqFcko36KxvrN7_W1fW1G65h77BVVDUKyzoRA39YFjuCp2On-f-kpwZVXq8OtYueXscz0fTYPYyeRoNZ4EWMmoC5MASJiFROeg05rEQTDKtw1wYo4qCoylYwSBXKMO4PSPkGiKeM5GC4CrqkrtD7srVbRO-yZbWayxLVWG99lkITEQJwN8wTSWEsfwHjNvZAvsbxkKKZJ94f4DtXL13aLKVs0vlthln2W6RGZfZfpEtvT1mKq9VaZyqtPW_HpJk10zrbg7OIuLP8yHjG4mro7M</recordid><startdate>19891001</startdate><enddate>19891001</enddate><creator>Chau, H.-F.</creator><creator>Pavlidis, D.</creator><creator>Cazaux, J.-L.</creator><creator>Graffeuil, J.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>7SP</scope><scope>7QF</scope><scope>8BQ</scope><scope>JG9</scope><scope>7U5</scope></search><sort><creationdate>19891001</creationdate><title>Studies of the DC, low-frequency, and microwave characteristics of uniform and step-doped GaAs/AlGaAs HEMTs</title><author>Chau, H.-F. ; Pavlidis, D. ; Cazaux, J.-L. ; Graffeuil, J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c463t-e19070697ab9c851544060cc2b4ffadd1efd0d09bae625fd0e9bc931b048941a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1989</creationdate><topic>Applied sciences</topic><topic>Automatic testing</topic><topic>Cutoff frequency</topic><topic>Electron mobility</topic><topic>Electronics</topic><topic>Etching</topic><topic>Exact sciences and technology</topic><topic>HEMTs</topic><topic>Low-frequency noise</topic><topic>MODFETs</topic><topic>Predictive models</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Threshold voltage</topic><topic>Transistors</topic><topic>Voltage control</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chau, H.-F.</creatorcontrib><creatorcontrib>Pavlidis, D.</creatorcontrib><creatorcontrib>Cazaux, J.-L.</creatorcontrib><creatorcontrib>Graffeuil, J.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Electronics & Communications Abstracts</collection><collection>Aluminium Industry Abstracts</collection><collection>METADEX</collection><collection>Materials Research Database</collection><collection>Solid State and Superconductivity Abstracts</collection><jtitle>IEEE transactions on electron devices</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chau, H.-F.</au><au>Pavlidis, D.</au><au>Cazaux, J.-L.</au><au>Graffeuil, J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Studies of the DC, low-frequency, and microwave characteristics of uniform and step-doped GaAs/AlGaAs HEMTs</atitle><jtitle>IEEE transactions on electron devices</jtitle><stitle>TED</stitle><date>1989-10-01</date><risdate>1989</risdate><volume>36</volume><issue>10</issue><spage>2288</spage><epage>2298</epage><pages>2288-2298</pages><issn>0018-9383</issn><eissn>1557-9646</eissn><coden>IETDAI</coden><abstract>A theoretical and experimental study of step-doped HEMTs (high electron mobility transition) with lightly and heavily doped regions is presented. Threshold voltage control and sensitivity with respect to growth parameters and recessing etching, as well as design criteria, are investigated for these structures. A three-regime charge control model is used to predict their performance. Using the same semianalytical theory, which was validated with the help of a self-consistent analysis, both conventional and step-doped HEMTs with an i-layer are compared. 1- mu m gate-length n-channel HEMTs with step-doped profile thicknesses of 25, 50, and 100 AA were fabricated and tested at low and high frequencies. The low-frequency noise can be controlled by the step thickness, and a noise analysis is presented. Cutoff frequencies of 16 to 18 GHz and maximum oscillation frequencies of 41 to 59 GHz were measured and correlated to the step thickness.< ></abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/16.40913</doi><tpages>11</tpages></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0018-9383 |
ispartof | IEEE transactions on electron devices, 1989-10, Vol.36 (10), p.2288-2298 |
issn | 0018-9383 1557-9646 |
language | eng |
recordid | cdi_proquest_miscellaneous_25464756 |
source | IEEE Xplore (Online service) |
subjects | Applied sciences Automatic testing Cutoff frequency Electron mobility Electronics Etching Exact sciences and technology HEMTs Low-frequency noise MODFETs Predictive models Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Threshold voltage Transistors Voltage control |
title | Studies of the DC, low-frequency, and microwave characteristics of uniform and step-doped GaAs/AlGaAs HEMTs |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-21T12%3A49%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_ieee_&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Studies%20of%20the%20DC,%20low-frequency,%20and%20microwave%20characteristics%20of%20uniform%20and%20step-doped%20GaAs/AlGaAs%20HEMTs&rft.jtitle=IEEE%20transactions%20on%20electron%20devices&rft.au=Chau,%20H.-F.&rft.date=1989-10-01&rft.volume=36&rft.issue=10&rft.spage=2288&rft.epage=2298&rft.pages=2288-2298&rft.issn=0018-9383&rft.eissn=1557-9646&rft.coden=IETDAI&rft_id=info:doi/10.1109/16.40913&rft_dat=%3Cproquest_ieee_%3E25464756%3C/proquest_ieee_%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c463t-e19070697ab9c851544060cc2b4ffadd1efd0d09bae625fd0e9bc931b048941a3%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=25464756&rft_id=info:pmid/&rft_ieee_id=40913&rfr_iscdi=true |