Wear resistance of arc-evaporated and magnetron-sputtered coatings on cemented carbides

• Published in: Surface & coatings technology 1989-12, Vol.39 (1-3), p.445-453
• Main Authors: Knotek, O., Atzor, M., Jungblut, F., Prengel, H.-G.
• Format: Article
• Language: English
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/S0257-8972(89)80006-4

The refinement of the physical vapour deposition (PVD) process has created the necessary conditions for controlled production of thin film systems with defined properties. Complex film systems such as (Ti,Al)N and (Ti,Al,V)N have particularly high potential as wear resistant functional coatings for highly-stressed tools. These films are deposited using the two highly-sophisticated PVD processes of ion plating with a magnetron sputtering source and ion plating with an ARC source. Methods of attaining defined film properties by altering process parameters are indicated. Production of the films is directly linked with analysis or the development of suitable analytic techniques. Film properties such as thickness, microhardness and adhesion are optimized for maximum wear resistance. X-ray microstructure analyses are used to determine the phases and their crystalline structures and orientations. Finally, scanning electron microscope images document the structure and formation of the films. The wear resistance of (Ti,Al)N- and (Ti,Al,V)N-coated indexable tips is demonstrated by means of machining tests under high stresses. The wear mechanisms are analysed and implications for further optimization of the films discussed.