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Borosilicate glass films as intermetal dielectrics

Glass films fabricated by CVD with < 4.5 wt% B were stable to moisture-induced decomposition, and had a dielectric constant of 3.8 at 1 MHz and breakdown of 9 MV/cm.

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Bibliographic Details
Published in:Journal of the Electrochemical Society 1990-05, Vol.137 (5), p.1501-1506
Main Authors: WHITE, L.K, SHAW, J. M, KURYLO, W. A, MISZKOWSKI, N
Format: Article
Language:English
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Description
Summary:Glass films fabricated by CVD with < 4.5 wt% B were stable to moisture-induced decomposition, and had a dielectric constant of 3.8 at 1 MHz and breakdown of 9 MV/cm.
ISSN:0013-4651
1945-7111
DOI:10.1149/1.2086700