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Borosilicate glass films as intermetal dielectrics
Glass films fabricated by CVD with < 4.5 wt% B were stable to moisture-induced decomposition, and had a dielectric constant of 3.8 at 1 MHz and breakdown of 9 MV/cm.
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Published in: | Journal of the Electrochemical Society 1990-05, Vol.137 (5), p.1501-1506 |
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Main Authors: | , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that cite this one |
Online Access: | Get full text |
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Summary: | Glass films fabricated by CVD with < 4.5 wt% B were stable to moisture-induced decomposition, and had a dielectric constant of 3.8 at 1 MHz and breakdown of 9 MV/cm. |
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ISSN: | 0013-4651 1945-7111 |
DOI: | 10.1149/1.2086700 |