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Dielectric-Base Transistor Using YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 Heterostructures
The fabrication and evaluation of dielectric-base transistors having high-T sub c YBa sub 2 Cu sub 3 O sub 7--x electrodes with NdGaO sub 3 low-permittivity barriers on SrTiO sub 3 high-permittivity substrates are described. The YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 heterostructure...
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Published in: | Journal of applied physics 1992-05, Vol.71 (10), p.5284-5286 |
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container_end_page | 5286 |
container_issue | 10 |
container_start_page | 5284 |
container_title | Journal of applied physics |
container_volume | 71 |
creator | Yoshida, A Tamura, H Takauchi, H Imamura, T Hasuo, S |
description | The fabrication and evaluation of dielectric-base transistors having high-T sub c YBa sub 2 Cu sub 3 O sub 7--x electrodes with NdGaO sub 3 low-permittivity barriers on SrTiO sub 3 high-permittivity substrates are described. The YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 heterostructures were made by laser ablation. Nb base electrodes were sputtered on the back of the SrTiO sub 3 substrate. The device showed transistor characteristics with voltage and current gains exceeding unity at 4.2K. The collector current density was approx 10 A/cm exp 2 at a collector voltage of 20 V, four orders of magnitude larger than that obtained for devices having no artificial barriers. |
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fullrecord | <record><control><sourceid>proquest</sourceid><recordid>TN_cdi_proquest_miscellaneous_25604913</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>25604913</sourcerecordid><originalsourceid>FETCH-proquest_miscellaneous_256049133</originalsourceid><addsrcrecordid>eNqNir0OgjAYRTtoIv68Qye3hkJV6Ar-TTKIgxOp-GlqKmi_NvHxTQjuTueemzMgAedxxFKZyBEZIz44j6JUyIDotQYDtbO6ZplCoKVVDWp0raUn1M2dnjNF0V9oTHPfDUGLjgljHxoerjtV9H94tKX-yR4c2Bad9bXzFnBKhjdlEGY9J2S-3ZT5nr1s-_aArnpqrMEY1UDrsYqXK76QkRB_h1_HCEb5</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>25604913</pqid></control><display><type>article</type><title>Dielectric-Base Transistor Using YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 Heterostructures</title><source>AIP Digital Archive</source><creator>Yoshida, A ; Tamura, H ; Takauchi, H ; Imamura, T ; Hasuo, S</creator><creatorcontrib>Yoshida, A ; Tamura, H ; Takauchi, H ; Imamura, T ; Hasuo, S</creatorcontrib><description>The fabrication and evaluation of dielectric-base transistors having high-T sub c YBa sub 2 Cu sub 3 O sub 7--x electrodes with NdGaO sub 3 low-permittivity barriers on SrTiO sub 3 high-permittivity substrates are described. The YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 heterostructures were made by laser ablation. Nb base electrodes were sputtered on the back of the SrTiO sub 3 substrate. The device showed transistor characteristics with voltage and current gains exceeding unity at 4.2K. The collector current density was approx 10 A/cm exp 2 at a collector voltage of 20 V, four orders of magnitude larger than that obtained for devices having no artificial barriers.</description><identifier>ISSN: 0021-8979</identifier><language>eng</language><ispartof>Journal of applied physics, 1992-05, Vol.71 (10), p.5284-5286</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780</link.rule.ids></links><search><creatorcontrib>Yoshida, A</creatorcontrib><creatorcontrib>Tamura, H</creatorcontrib><creatorcontrib>Takauchi, H</creatorcontrib><creatorcontrib>Imamura, T</creatorcontrib><creatorcontrib>Hasuo, S</creatorcontrib><title>Dielectric-Base Transistor Using YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 Heterostructures</title><title>Journal of applied physics</title><description>The fabrication and evaluation of dielectric-base transistors having high-T sub c YBa sub 2 Cu sub 3 O sub 7--x electrodes with NdGaO sub 3 low-permittivity barriers on SrTiO sub 3 high-permittivity substrates are described. The YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 heterostructures were made by laser ablation. Nb base electrodes were sputtered on the back of the SrTiO sub 3 substrate. The device showed transistor characteristics with voltage and current gains exceeding unity at 4.2K. The collector current density was approx 10 A/cm exp 2 at a collector voltage of 20 V, four orders of magnitude larger than that obtained for devices having no artificial barriers.</description><issn>0021-8979</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1992</creationdate><recordtype>article</recordtype><recordid>eNqNir0OgjAYRTtoIv68Qye3hkJV6Ar-TTKIgxOp-GlqKmi_NvHxTQjuTueemzMgAedxxFKZyBEZIz44j6JUyIDotQYDtbO6ZplCoKVVDWp0raUn1M2dnjNF0V9oTHPfDUGLjgljHxoerjtV9H94tKX-yR4c2Bad9bXzFnBKhjdlEGY9J2S-3ZT5nr1s-_aArnpqrMEY1UDrsYqXK76QkRB_h1_HCEb5</recordid><startdate>19920515</startdate><enddate>19920515</enddate><creator>Yoshida, A</creator><creator>Tamura, H</creator><creator>Takauchi, H</creator><creator>Imamura, T</creator><creator>Hasuo, S</creator><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>19920515</creationdate><title>Dielectric-Base Transistor Using YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 Heterostructures</title><author>Yoshida, A ; Tamura, H ; Takauchi, H ; Imamura, T ; Hasuo, S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-proquest_miscellaneous_256049133</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1992</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yoshida, A</creatorcontrib><creatorcontrib>Tamura, H</creatorcontrib><creatorcontrib>Takauchi, H</creatorcontrib><creatorcontrib>Imamura, T</creatorcontrib><creatorcontrib>Hasuo, S</creatorcontrib><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yoshida, A</au><au>Tamura, H</au><au>Takauchi, H</au><au>Imamura, T</au><au>Hasuo, S</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Dielectric-Base Transistor Using YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 Heterostructures</atitle><jtitle>Journal of applied physics</jtitle><date>1992-05-15</date><risdate>1992</risdate><volume>71</volume><issue>10</issue><spage>5284</spage><epage>5286</epage><pages>5284-5286</pages><issn>0021-8979</issn><abstract>The fabrication and evaluation of dielectric-base transistors having high-T sub c YBa sub 2 Cu sub 3 O sub 7--x electrodes with NdGaO sub 3 low-permittivity barriers on SrTiO sub 3 high-permittivity substrates are described. The YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 heterostructures were made by laser ablation. Nb base electrodes were sputtered on the back of the SrTiO sub 3 substrate. The device showed transistor characteristics with voltage and current gains exceeding unity at 4.2K. The collector current density was approx 10 A/cm exp 2 at a collector voltage of 20 V, four orders of magnitude larger than that obtained for devices having no artificial barriers.</abstract></addata></record> |
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title | Dielectric-Base Transistor Using YBa sub 2 Cu sub 3 O sub 7--x /NdGaO sub 3 /SrTiO sub 3 Heterostructures |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-24T03%3A20%3A15IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Dielectric-Base%20Transistor%20Using%20YBa%20sub%202%20Cu%20sub%203%20O%20sub%207--x%20/NdGaO%20sub%203%20/SrTiO%20sub%203%20Heterostructures&rft.jtitle=Journal%20of%20applied%20physics&rft.au=Yoshida,%20A&rft.date=1992-05-15&rft.volume=71&rft.issue=10&rft.spage=5284&rft.epage=5286&rft.pages=5284-5286&rft.issn=0021-8979&rft_id=info:doi/&rft_dat=%3Cproquest%3E25604913%3C/proquest%3E%3Cgrp_id%3Ecdi_FETCH-proquest_miscellaneous_256049133%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=25604913&rft_id=info:pmid/&rfr_iscdi=true |